Zobrazeno 1 - 10
of 34
pro vyhledávání: '"Hee-Woon Cheong"'
Autor:
Hee-Woon Cheong1 (AUTHOR), Lee, Woohyun2 (AUTHOR), Kim, Ji-Won2 (AUTHOR), Cha, Sujin3 (AUTHOR), Kim, Kyoungji4 (AUTHOR), Lee, Hwally5 (AUTHOR) hwally@nate.com
Publikováno v:
Plasma Physics Reports. Mar2020, Vol. 46 Issue 3, p328-335. 8p.
Publikováno v:
Plasma Physics Reports. 46:328-335
Non-uniformities in the plasma parameters in a magnetized inductively coupled plasma (M-ICP) etcher were investigated. Further in text of this article the silicon dioxide and the photoresist are called as abbreviations the oxide and the PR accordingl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::608d43472531b7bc137bff1c4339fbea
https://doi.org/10.1134/s1063780x20030034
https://doi.org/10.1134/s1063780x20030034
Publikováno v:
Физика плазмы. 46:281-288
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b03888183292d781f26fffb33d151a7a
https://doi.org/10.31857/s0367292120030038
https://doi.org/10.31857/s0367292120030038
Autor:
Hee Woon Cheong, Hyunsoo Lee
Publikováno v:
ITQM
With the observed rise in temperature, many researchers have tried to identify the causes of such climate change to help mitigate its effects. The objective of this study is to determine whether, under the same carbon dioxide (CO2) concentrations, CO
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c98032c862b993ec2c3c3ded0184f293
https://doi.org/10.1016/j.procs.2018.10.223
https://doi.org/10.1016/j.procs.2018.10.223
Autor:
Hee-Woon Cheong, Hwally Lee
Publikováno v:
ITQM
Humanity is witnessing the next generation industrial revolution, so-called the fourth industrial revolution. In the fourth industrial revolution era, the high level of ICTs (Information and Communication Technologies) such as AI (Artificial Intellig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d8080583bfcce88de165bbe019cef723
https://doi.org/10.1016/j.procs.2018.10.222
https://doi.org/10.1016/j.procs.2018.10.222
Autor:
Hwally Lee, Hee-Woon Cheong
Publikováno v:
ITQM
Humanity is witnessing the next generation industrial revolution, so-called the fourth industrial revolution. In the fourth industrial revolution era, the high level of ICTs (Information and Communication Technologies) such as AI (Artificial Intellig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a2e24576b8d1fab736d8375162a7771
https://doi.org/10.1016/j.procs.2017.11.347
https://doi.org/10.1016/j.procs.2017.11.347
Publikováno v:
Journal of Applied Physics; 3/7/2016, Vol. 119 Issue 9, p095502-1-095502-6, 6p, 2 Diagrams, 4 Graphs
Autor:
Hee-Woon Cheong
Publikováno v:
Journal of Magnetics. 21:222-228
Correlation between coil configurations and the discharge characteristics such as plasma density and the electron temperature in a newly designed magnetized inductively coupled plasma (M-ICP) etcher were investigated. Radial and axial magnetic flux d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fbf03f18a044a86d13589c219b8b4c2f
https://doi.org/10.4283/jmag.2016.21.2.222
https://doi.org/10.4283/jmag.2016.21.2.222
Autor:
Hee-Woon Cheong
Publikováno v:
Procedia Computer Science. 91:478-481
In this paper, the proper education model of management of technology (MoT) for small- and medium-sized enterprises (SMEs) was proposed. Considering the regional industrial structure in Chungcheongnam-do and global trend change, it is concluded that
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8f850ccf508fdabb38fd193e8937ab03
Autor:
Woohyun Lee, Hyuk Kim, Park, Wanjae, Wan-Soo Kim, Donghyun Kim, Ji-Won Kim, Hee-Woon Cheong, Ki-Woong Whang
Publikováno v:
Journal of Applied Physics; 2015, Vol. 117 Issue 17, p173302-1-173302-6, 6p, 1 Diagram, 3 Charts, 5 Graphs