Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Hee Jung Yeom"'
Autor:
Si Jun Kim, Jang Jae Lee, Young Seok Lee, Hee Jung Yeom, Hyo Chang Lee, Jung-Hyung Kim, Shin Jae You
Publikováno v:
Applied Sciences, Vol 10, Iss 20, p 7066 (2020)
The microwave planar cutoff probe, recently proposed by Kim et al. is designed to measure the cutoff frequency in a transmission (S21) spectrum. For real-time electron density measurement in plasma processing, three different types have been demonstr
Externí odkaz:
https://doaj.org/article/f307b7f7fb924c2e9292686bc7075999
Autor:
Hee-Jung Yeom, Min Young Yoon, Daehan Choi, Youngseok Lee, Jung-Hyung Kim, Shin-Jae You, Hyo-Chang Lee
Publikováno v:
ACS Omega, Vol 8, Iss 36, Pp 32450-32457 (2023)
Externí odkaz:
https://doaj.org/article/da121a37c39641ad8accc680824953d4
Autor:
Eun-Seok Choe, Seungwook Choi, Ansoon Kim, Kwan-Yong Kim, Hee-Jung Yeom, Min Young Yoon, Seongwan Hong, Dong-Wook Kim, Jung-Hyung Kim, Hyo-Chang Lee
Publikováno v:
Advanced Materials Interfaces; 3/5/2024, Vol. 11 Issue 7, p1-9, 9p
Publikováno v:
Applied Science and Convergence Technology. 32:34-37
Autor:
Hee Jung Yeom, R. Navamathavan, Lee,Hyo-Chang, You, ShinJae, Youngseok Lee, Si Jun Kim, Kim Jung Hyung, Chul Hee Cho
Publikováno v:
Applied Science and Convergence Technology. 29:77-81
Autor:
Young Seok Lee, Shin-Jae You, Hee Jung Yeom, Si Jun Kim, Jung-Hyung Kim, Jang Jae Lee, Hyo-Chang Lee
Publikováno v:
Applied Sciences
Volume 10
Issue 20
Applied Sciences, Vol 10, Iss 7066, p 7066 (2020)
Volume 10
Issue 20
Applied Sciences, Vol 10, Iss 7066, p 7066 (2020)
The microwave planar cutoff probe, recently proposed by Kim et al. is designed to measure the cutoff frequency in a transmission (S21) spectrum. For real-time electron density measurement in plasma processing, three different types have been demonstr
Autor:
Jong-Ryul Jeong, Won Chegal, Deuk-Chul Kwon, Min Young Yoon, Hyo-Chang Lee, Jung-Hyung Kim, Hee Jung Yeom, Yong Jai Cho
Publikováno v:
Physics of Plasmas. 28:063504
Atomic layer etching (ALE), a cyclic process of surface modification and removal of the modified layer, is an emerging damage-less etching technology for semiconductor fabrication with a feature size of less than 10 nm. Among the plasma sources, indu
Publikováno v:
Plasma Sources Science and Technology. 30:065012
Autor:
Hyo-Chang Lee, Hee Jung Yeom, Shin-Jae You, M Y Yoon, Daehan Choi, E S Choi, Jin-Gyu Kim, D. J. Seong
Publikováno v:
Plasma Sources Science and Technology. 29:035016
The microwave cutoff probe (CP) is an accurate diagnostic technique to measure absolute electron density even in processing gas plasmas. Because this technique needs the installation of two probe tips and a probe body in the plasma chamber, it may ca
Autor:
D. J. Seong, Jin-Gyu Kim, Julian Schulze, Zoltan Donko, A. Derzsi, K. H. You, Hyo-Chang Lee, Hee Jung Yeom
Publikováno v:
Physics of Plasmas. 26:013503
Geometrically symmetric capacitively coupled oxygen plasmas are studied experimentally by optical emission spectroscopy and probe measurements as well as via numerical simulations using the kinetic Particle-in-Cell/Monte Carlo collision (PIC/MCC) app