Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Hedvi Spielberg"'
Autor:
Hyunsok Kim, Ikhyun Jeong, Baikkyu Hong, Sejung Ham, Dongsu Kim, Dongsuk Lim, Kangmin Lee, Jeongpyo Lee, Minho Jung, Nanglyeom Oh, Dongsub Choi, Hedvi Spielberg, Ohad Bachar
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Autor:
Shlomit Katz, Suk Won Park, Joonsang You, Hyunjun Kim, Hong Goo Lee, Jungchan Kim, Dongyoung Lee, Hongbok Yeon, Joon-Seuk Lee, Sang-Ho Lee, Jae Wook Seo, Dor Yehuda, Junho Kim, Hongcheon Yang, DoHwa Lee, Nanglyeom Oh, DongSub Choi, Wayne Zhou, Hedvi Spielberg, Ohad Bachar
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Autor:
Hyun-Sok Kim, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Sumin Jang, Kangmin Lee, Hongpeng Su, Minho Jeong, Mingyu Kim, Hongcheon Yang, Wayne Zhou, Nanglyeom Oh, DongSub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Rawi Dirawi
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Autor:
Hyunsok Kim, Jaewuk Ju, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Changkyu Lee, Kangmin Lee, Sumin Jang, Jaeyoun Lee, Hongcheon Yang, Minho Jeong, Mingyu Kim, Hongpeng Su, Wayne Zhou, Nanglyeom Oh, DongSub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Renan Milo, Rawi Dirawi
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Autor:
Vladimir Levinski, Yuri Paskover, Sharon Aharon, Daria Negri, Nadav Gutman, Nireekshan Reddy Kothakapu, Jeongpyo Lee, Hedvi Spielberg, DongYoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Hongseok Jang, Honggoo Lee, Sangho Lee
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Autor:
Nahee Park, Dohwa Lee, Liu Liu, Xuefei Zhou, Hongpeng Su, DongSub Choi, Wayne Zhou, Hedvi Spielberg, Efi Megged, Chen Dror, Diana Shaphirov, Zephyr Liu, Mark Ghinovker, DongYoung Lee, Hongbok Yeon, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Autor:
Katya Gordon, Hedvi Spielberg, Diana Shaphirov, Xiaolei Liu, Eltsafon Ashwal, Eitan Hajaj, Philippe Leray, Mark Ghinovker, Chen Dror, Raviv Yohanan, Zephyr Liu, Dieter Van den Heuvel, Roel Gronheid
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
As design nodes of advanced semiconductor chips shrink, reduction in on-product overlay (OPO) budget becomes more critical to achieving higher yield. Imaging-based overlay (IBO) targets usually consist of periodic patterns where their pitches are res
Autor:
Moran Zaberchik, Scott Beatty, Sanghuck Jeon, Nir BenDavid, Chanha Park, Sang Ho Lee, Dongsub Choi, Dongyoung Lee, Telly Koffas, Chen Li, Ramkumar Karur-Shanmugam, Dongsoo Kim, Honggoo Lee, Jae Young Park, Hedvi Spielberg, Efi Megged, Dohwa Lee
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
We developed a statistical method that can be applied to overlay metrology tools to improve performance and time-to-results (TTR) of multi-cycle optimization based on the brute force method. First, we evaluated full response surfaces for each combina
Autor:
Hedvi Spielberg, Raviv Yohanan, Alon Volfman, Eitan Hajaj, Xindong Gao, Xiaolei Liu, Yoav Grauer
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
For today’s advanced processes, in order to achieve higher optical lithography resolution, some of the layers require extreme dipole illumination conditions. One example is the modern DRAM process, where numerous critical layers are patterned with
Autor:
Dae Jong Kim, Chul-Hong Kim, Hak Kwon Lee, Hyung Won Yoo, Yariv Bustan, Yun Ho Lee, Moshe Rozentsvige, Koon Ho Bae, Shimon Levi, Sung Su Kim, Hedvi Spielberg
Publikováno v:
SPIE Proceedings.
As design rules shrink, Critical Dimension Uniformity (CDU) and Line Edge Roughness (LER) have a dramatic effect on printed final lines and hence the need to control these parameters increases. Sources of CDU and LER variations include scanner auto-f