Zobrazeno 1 - 10
of 27
pro vyhledávání: '"Hector Medecki"'
Autor:
David Attwood, Patrick P. Naulleau, James H. Underwood, Phillip J. Batson, Eric M. Gullikson, Hector Medecki, Edita Tejnil, Chang Chang, R. Beguiristain, Kenneth A. Goldberg, Jeffrey Bokor, Masato Koike
Publikováno v:
IEEE Journal of Quantum Electronics. 35:709-720
Undulator radiation, generated by relativistic electrons traversing a periodic magnet structure, can provide a continuously tunable source of very bright and partially coherent radiation in the extreme ultraviolet (EUV), soft X-ray (SXR), and X-ray r
Autor:
Cathleen Magowan, Werner Meyer-Ilse, C. Petersen, Anthony D. Stead, D. Attwood, Erik H. Anderson, Rod Balhorn, J. T. Brown, T.W. Ford, Hector Medecki, John Heck
Publikováno v:
X-Ray Microscopy and Spectromicroscopy ISBN: 9783642721083
A new high resolution soft X-ray microscope (XM-1) has been used in a variety of applications. It is a conventional transmission microscope with a zone plate condenser and objective. A mutual indexing system incorporates state-of-the-art visible ligh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fbe8a4f75679e1e7fbf6f6c92216dab5
https://doi.org/10.1007/978-3-642-72106-9_1
https://doi.org/10.1007/978-3-642-72106-9_1
Autor:
Cynthia J. Bresloff, Ken Goldberg, Chang Chang, Jeffrey Bokor, Sang Hun Lee, Edita Tejnil, David Attwood, Patrick P. Naulleau, Hector Medecki
Publikováno v:
The 1998 international conference on characterization and metrology for ULSI technology.
A phase-shifting point diffraction interferometer (PS/PDI) has recently been developed to evaluate optics for extreme ultraviolet (EUV) projection lithography systems. The interferometer has been implemented at the Advanced Light Source at Lawrence B
Autor:
Kenneth A. Goldberg, Jeffrey Bokor, Keith H. Jackson, Sang Hun Lee, Hector Medecki, Edita Tejnil, David Attwood
Publikováno v:
SPIE Proceedings.
We report wavefront measurement of a multilayer-coated, reflective optical system at 13.4-nm wavelength performed using a novel phase-shifting point-diffraction interferometer. Successful interferometric measurements of a 10x Schwarzschild objective
Autor:
David Attwood, Hector Medecki, James H. Underwood, H. R. Beguiristain, Keith H. Jackson, Phillip J. Batson, Masato Koike, Eric M. Gullikson
Publikováno v:
SPIE Proceedings.
A long undulator installed at a low emittance storage ring, generates quasi-monochromatic beams of high brightness and partial coherence properties; however, this also raises concerns regarding high heat loads on beam line components. There have been
Autor:
Hector Medecki, David Attwood, Edita Tejnil, Kenneth A. Goldberg, Raul Beguiristain, Jeffrey Bokor
Publikováno v:
Optical Fabrication and Testing.
The Center for X-Ray Optics is performing metrology of optics intended to be used for lithography at wavelengths in the Extreme Ultraviolet (EUV) range. The source for this radiation is an undulator operating at the Advanced Light Source (ALS). Initi
Autor:
Kenneth A. Goldberg, Ralph E. Hostetler, Hector Medecki, James P. Spallas, Keith H. Jackson, Jeffrey Bokor, H. Raul Beguiristain, Gary E. Sommargren, David Attwood
Publikováno v:
SPIE Proceedings.
Optical systems for extreme ultraviolet (EUV) lithography require optical elements with wavefront aberrations limited to a fraction of an EUV wavelength to achieve diffraction-limited performance. Achieving wavefront and surface figure metrology at t
Autor:
David Attwood, Hector Medecki, Phillip J. Batson, James H. Underwood, Keith H. Jackson, Masato Koike, Seno Rekawa, H. Raul Beguiristain
Publikováno v:
Review of Scientific Instruments. 67:3354-3355
This study analyzes synchrotron radiation heat loading effects on optical components of beamline BL12.0 for EUV interferometry and soft x‐ray microscopy at the Advanced Light Source (ALS). Newly developed indirect side‐cooled beamline optics were
Autor:
Hector Medecki, Jeffrey Bokor, Alastair A. MacDowell, David Attwood, Phillip J. Batson, Sang Hun Lee, Kenneth A. Goldberg, Edita Tejnil, Paul Denham
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 15:2455
A phase-shifting point diffraction interferometer is being developed for at-wavelength testing of extreme ultraviolet lithographic optical systems. The interferometer was implemented to characterize the aberrations of a 10× Schwarzschild multilayer-
Autor:
David Attwood, Jeffrey Bokor, R. Beguiristain, Keith H. Jackson, Edita Tejnil, Hector Medecki, Kenneth A. Goldberg
Publikováno v:
Review of Scientific Instruments. 67:3353-3353
Optical systems for extreme ultraviolet (EUV) lithography need to use optical components with subnanometer surface figure error tolerances to achieve diffraction‐limited performance [M.D. Himel, in Soft X‐Ray Projection Lithography, A.M. Hawryluk