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Autor:
Lucas Güniat, Lea Ghisalberti, Li Wang, Christian Dais, Nicholas Morgan, Didem Dede, Wonjong Kim, Akshay Balgarkashi, Jean-Baptiste Leran, Renato Minamisawa, Harun Solak, Craig Carter, Anna Fontcuberta i Morral
Publikováno v:
Nanoscale Horizons. 7:211-219
Large-scale patterning for vapor-liquid-solid growth of III-V nanowires is a challenge given the required feature size for patterning (45 to 60 nm holes). In fact, arrays are traditionally manufactured using electron-beam lithography,for which proces