Primary Results of the Multicenter ARISE II Study (Analysis of Revascularization in Ischemic Stroke With EmboTrap)

Autor: Zaidat, Osama O., Bozorgchami, Hormozd, Ribó, Marc, Saver, Jeffrey L., Mattle, Heinrich P., Chapot, René, Narata, Ana Paula, Francois, Olivier, Jadhav, Ashutosh P., Grossberg, Jonathan A., Riedel, Christian H., Tomasello, Alejandro, Clark, Wayne M., Nordmeyer, Hannes, Lin, Eugene, Nogueira, Raul G., Yoo, Albert J., Jovin, Tudor G., Siddiqui, Adnan H., Bernard, Thierry, Claffey, Mairsíl, Andersson, Tommy, Ribo, M., Hetts, S., Hacke, W., Mehta, Brijesh, Hacein-Bey, L., Kim, A., Abou-Chebl, A., Shabe, P., Hetts, S., Hacein-Bey, L., Kim, A., Abou-Chebl, A., Dix, J., Gurian, J., Zink, W.E., Dabus, G., O’Leary, N., Reilly, A., Lee, K., Foley, J., Dolan, M., Hartley, E., Clark, T., Nadeau, K., Shama, J., Hull, L., Brown, B., Priest, R., Nesbit, G., Horikawa, M., Hoak, D., Petersen, B., Beadell, Noah, Herrick, Kory, White, C., Stacey, M., Ford, S., Liu, J., Ribó, M., Sanjuan, E., Sanchis, M., Molina, C., Rodríguez-Luna, D., Boned Riera, S., Pagola, J., Rubiera, M., Juega, J., Rodríguez, N., Muller, N., Stauder, M., Stracke, P., Heddier, M., Charron, V., Decock, A., Herbreteau, D., Bibi, R., De Sloovere, A.S., Doutreloigne, I., Pieters, D., Dewaele, T., Bourgeois, P., Vanhee, F., Vanderdouckt, P., Vancaster, E., Baxendell, L., Gilchrist, V., Cannon, Y., Graves, C., Armbruster, K., Jovin, T., Jankowitz, B., Ducruet, A., Aghaebrahim, A., Kenmuir, C., Shoirah, H., Molyneaux, B., Tadi, P., Walker, G., Starr, M., Doppelheuer, S., Schindler, K., Craft, L., Schultz, M., Perez, H., Park, J., Hall, A., Mitchell, A., Webb, L., Haussen, D., Frankel, M., Bianchi, N., Belagaje, S., Mahdi, N., Lahoti, S., Katema, A., Winningham, M., Anderson, A., Tilley, D.A., Steinhauser, T., Scott, D., Thacker, A., Calderon, V., Lin, E., Becke, S., Krieter, S., Jansen, O., Wodarg, F., Larsen, N., Binder, A., Wiesen, C., Hartney, M., Bookhagan, L., Ross, H., Gay, J., Snyder, K., Levy, E., Davies, J., Sonig, A., Rangel-Castilla, L., Mowla, A., Shakir, H., Fennell, V., Atwal, G., Natarajan, S., Beecher, J., Thornton, J., Cullen, A., Brennan, P., O’Hare, A., Asadi, H., Budzik, R., Taylor, M., Jennings, M., Laube, F., Jackson, J., Gatrell, R., Reebel, L., Albon, A., Gerniak, J., Groezinger, K., Lauf, M., Voraco, N., Pema, P., Davis, T., Hicks, W., Mejilla, J., Teleb, M., Sunenshine, P., Russo, E., Flynn, R., Twyford, J., Ver Hage, A., Smith, E., Apolinar, L., Blythe, S., Maxan, J., Carter, J., Taschner, T., Bergmann, U., Meckel, S., Elsheik, S., Urbach, H., Maurer, C., Egger, K., Niesen, W.D., Baxter, B.W., Knox, A., Hazelwood, B., Quarfordt, S., Calvert, J., Hawk, H., Malek, R., Padidar, A., Tolley, U., Gutierrez, A., Mordasini, P., Seip, T., Balasubramaniam, R., Gralla, J., Fischer, U., Zibold, F., Piechowiak, E., DeLeacy, R., Apruzzeses, R., Alfonso, C., Haslett, J., Fifi, J., Mocco, J., Starkman, S., Guzy, J., Grunberg, N., Szeder, V., Tateshima, S., Duckwiler, G., Nour, M., Liebeskind, D., Tang, X., Hinman, J., Tipirneni, A., Yavagal, D., Guada, L., Bates, K., Balladeras, S., Bokka, S.K., Suir, S., Caplan, J., Kandewall, P., Peterson, E., Starke, R.M., Puri, A., Hawk, M., Brooks, C., L’Heurex, J., Ty, K., Rex, D., Massari, F., Wakhloo, A., Lozano, D., Rodrigua, K.D., Pierot, L., Fabienne, M., Sebastien, S., Emmoinoli, M.G.

Publikováno v: Stroke (Ovid); May 2018, Vol. 49 Issue: 5 p1107-1115, 9p

Oxygen plasma etching for resist stripping and multilayer lithography.

Autor: Hartney, M. A., Hess, D. W., Soane, D. S.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1989, Vol. 7 Issue 1, p1-13, 13p

Block copolymers as bilevel resists.

Autor: Hartney, M. A., Novembre, A. E., Bates, F. S.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1985, Vol. 3 Issue 5, p1346-1351, 6p

Optimal developer selection for negative acting resists.

Autor: Novembre, A. E., Masakowski, L. M., Hartney, M. A.

Publikováno v: Polymer Engineering & Science; Sep1986, Vol. 26 Issue 16, p1158-1164, 7p

Surface imaging of focused ion-beam exposed resists.

Autor: Hartney, M. A., Shaver, D. C., Shepard, M. I., Melngailis, J., Medvedev, V., Robinson, W. P.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1991, Vol. 9 Issue 6, p3432-3435, 4p