Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Harry Shields"'
Autor:
Harry Shields, Michael B. Petach, Rocco A. Orsini, Steven W. Fornaca, Richard H. Moyer, R.J. St Pierre
Publikováno v:
Proceedings of the IEEE. 90:1689-1695
Pulsed Nd:YAG lasers have been developed to achieve high peak power and high pulse repetition rate. These systems are being used as drivers for laser-produced plasmas which efficiently convert the 1064-nm laser output to extreme ultraviolet (EUV) lig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aac63be7524d780bad92d431bceb5e03
https://doi.org/10.1109/jproc.2002.803660
https://doi.org/10.1109/jproc.2002.803660
Publikováno v:
Journal of Applied Physics. 90:3726-3734
Laser produced plasmas (LPPs) provide a stable source of extreme ultraviolet (EUV) light making them well suited for use in next-generation lithography tools. The plasma is generated by directing a laser at a target composed of a partially condensed
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9bfed4cdb678fdada828e9ba891135d6
https://doi.org/10.1063/1.1403681
https://doi.org/10.1063/1.1403681
Autor:
Juan R. Maldonado, H Goodson, I. C. E. Turcu, P. Trenda, Dimitri Batani, I.N. Ross, P Fluck, Harry Shields
Publikováno v:
Microelectronic Engineering. 23:207-210
Several absolute X-ray flux calibration techniques were used on the excimer laser-plasma source operating with 7ps pulse trains. Good agreement was obtained for the source operated at ∼100mW X-ray average power and ∼lnm wavelength. Based on this
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cc1b48e4236f4238936deddf7b03be2e
https://doi.org/10.1016/0167-9317(94)90138-4
https://doi.org/10.1016/0167-9317(94)90138-4
Autor:
Lawrence Iwaki, Roy D. Mcgregor, Armando Martos, Michael B. Petach, Harry Shields, James M. Zamel, Stuart J. McNaught, Richard H. Moyer, Rocco A. Orsini, Samuel Ponti, Mark E. Michaelian, Armando Villarreal, Randall J. St. Pierre, Jeffrey S. Hartlove, Vivek Bakshi, Mark Thomas, Fernando Martos, Steven W. Fornaca
This chapter gives an overview of LPP EUV source development work at Northrop Grumman Corporation (NGC). The chapter covers development of the laser module, xenon target, and overall system. The volume editor (V. Bakshi) prepared this chapter as a su
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f510773489e33cd43942d94b2993b24a
https://doi.org/10.1117/3.613774.ch25
https://doi.org/10.1117/3.613774.ch25
Autor:
Karen L. Jefferson, Richard J. Anderson, Mark D. Zimmerman, Philip A. Grunow, J. Taylor, Patrick P. Naulleau, Alvin H. Leung, Pamela K. Barr, Richard H. Campiotti, E. M. Gullikson, Tony G. Smith, Leonard E. Klebanoff, Layton C. Hale, Henry N. Chapman, R. Lafon, Kenneth A. Goldberg, Sang Hun Lee, Joel R. Darnold, Yon E. Perras, William C. Replogle, Samuel Ponti, Steven J. Haney, John B. Wronosky, Terry A. Johnson, Kenneth A. Williams, Daniel A. Tichenor, Harry Shields, Therese L. Porter, James L. Van De Vreugde, Daniel L. Knight, W. P. Ballard, Luis J. Bernardez, Donna J. O'Connell, Randall J. St. Pierre, Dean A. Buchenauer, Kenneth L. Blaedel, Samuel Graham, G. E. Sommargren
Publikováno v:
SPIE Proceedings.
Full-field imaging with a developmental projection optic box (POB 1) was successfully demonstrated in the alpha tool Engineering Test Stand (ETS) last year. Since then, numerous improvements, including laser power for the laser-produced plasma (LPP)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::70d0f48bae34ecc0bda1359d98956942
https://doi.org/10.1117/12.482791
https://doi.org/10.1117/12.482791
Autor:
Fernando Martos, Stuart J. McNaught, Richard H. Moyer, Mark E. Michaelian, Randall J. St. Pierre, Steven W. Fornaca, Harry Shields
Publikováno v:
Frontiers in Optics.
Progress in laser-produced plasma EUV generation for advanced micro-lithography is reviewed and compared with industry requirements. Performance of a high power diode-pumped Nd:YAG laser and a xenon target is presented, demonstrating that intense emi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07d1395a497028f10158c9bc50f2f308
https://doi.org/10.1364/fio.2003.tud2
https://doi.org/10.1364/fio.2003.tud2
Autor:
Alvin H. Leung, Randall J. St. Pierre, Luis J. Bernardez, W. P. Ballard, Harry Shields, R. Lafon, Michael B. Petach, Richard J. Anderson, Robert L. Bristol, Yon E. Perras
Publikováno v:
Emerging Lithographic Technologies VI.
The Engineering Test Stand (ETS) is an 'alpha-class' Extreme Ultraviolet (EUV) lithography tool designed to demonstrate full-field EUV imaging and provide data required to accelerate production-tool development. The illumination system of the ETS is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e249a0ae94ecdd5e2ab81b169ebdf1b
https://doi.org/10.1117/12.472303
https://doi.org/10.1117/12.472303
Autor:
Alvin H. Leung, Terry A. Johnson, Samual Graham, David Attwood, Kenneth A. Goldberg, Leonard E. Klebanoff, John E. M. Goldsmith, Daniel A. Tichenor, Donald W. Sweeney, John B. Wronosky, Sang Hun Lee, Karen L. Jefferson, Glenn D. Kubiak, W. P. Ballard, Patrick P. Naulleau, John S. Taylor, James A. Folta, Gary E. Sommargren, Layton C. Hale, Harry Shields, Henry N. Chapman, William C. Replogle, Tony G. Smith, Eric M. Gullikson
Publikováno v:
Emerging Lithographic Technologies VI.
The EUV Engineering Test Stand (ETS) has demonstrated the printing of 100-nm-resolution scanned images. This milestone was first achieved while the ETS operated in an initial configuration using a low power laser and a developmental projection system
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9c088535fab5c49e547816b6357d6dfc
https://doi.org/10.1117/12.472328
https://doi.org/10.1117/12.472328
Autor:
Michael B. Petach, Steven W. Fornaca, Harry Shields, Richard H. Moyer, Randall J. St. Pierre, Mark Michaelian, R. Daniel McGregor
Publikováno v:
Emerging Lithographic Technologies VI.
Laser-produced plasmas (LPPs) are being developed as light sources for EUV lithography. To meet the requirements for high-volume manufacturing, LPP EUV sources must generate intense EUV output in the 13.5 nm band, and minimize source-induced degradat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0fa6f9a22ba57d9808b8eb792ba9386d
https://doi.org/10.1117/12.472266
https://doi.org/10.1117/12.472266
Publikováno v:
SPIE Proceedings.
Laser produced plasmas (LPP) provide a stable source of EUV making them well suited for use in next-generation lithography tools. The plasma is generated by directing a laser at a target composed of a partially condensed gas after it undergoes a supe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::90d43e2e4d2b0e07dc5b82b57673e1f0
https://doi.org/10.1117/12.436682
https://doi.org/10.1117/12.436682