Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Harry Botermans"'
Publikováno v:
Microelectronic Engineering. 35:517-522
One of the critical applications of DUV (248nm) lithography for 0.25 μm technology is the imaging of contact and via holes. The goal of this work was to demonstrate and verify manufacturing process capability for imaging 0.25 μm design rule (300 nm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a535df6599a1cf6a18214ee48668ecc
https://doi.org/10.1016/s0167-9317(96)00200-6
https://doi.org/10.1016/s0167-9317(96)00200-6
Autor:
Kurt G. Ronse, Harry Botermans, Kouros Ghandehari, Peter De Bisschop, Luc Van den Hove, Maaike Op de Beeck, John A. Lilygren, Jo Finders, Daniel Claire Baker, Mireille Maenhoudt, Patrick Jaenen, Geert Vandenberghe
Publikováno v:
SPIE Proceedings.
In this paper, the results of an NA-sigma optimisation study are reported, carried out experimentally for an advanced ASML PAS5500/300 deep-UV stepper. The work has been primarily focused on a 0.25 and sub-0.25 mu m gate layer in a logic CMOS process
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::270f39e013a213d90086607d05f554bf
https://doi.org/10.1117/12.275973
https://doi.org/10.1117/12.275973
Autor:
Anthony Yen, Rik Jonckheere, Maaike Op de Beeck, Bert Bruggeman, Alexander Tritchkov, Veerle Van Driessche, Kurt G. Ronse, Harry Botermans, Luc Van den Hove
Publikováno v:
SPIE Proceedings.
Optical proximity effects (OPE) are narrowing the process window in the 0.25micrometers - 0.18micrometers CD range. Hence optical proximity correction (OPC) might be required. These proximity effects and correction strategies are studied in detail in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb25f792e539dabf00c07bb41b261d3f
https://doi.org/10.1117/12.240927
https://doi.org/10.1117/12.240927
Conference
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.