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pro vyhledávání: '"Harpal Bharaj"'
Autor:
Harpal Bharaj, Andrew J. Turberfield, David N. Sharp, Henning Urban, Robert G. Denning, Christopher F. Blanford
Publikováno v:
Advanced Functional Materials. 21:1593-1601
The negative-tone epoxy photoresist, SU-8, expands ≈1% by volume after postexposure baking. However, if the maximum optical fl uence is comparable to that at the insolubility threshold, as in a holographic exposure, the developed resist shrinks (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::246cf7cebbaa2158b7d0eb8adcbbd241
https://doi.org/10.1002/adfm.201002653
https://doi.org/10.1002/adfm.201002653
