Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Harold Hearne"'
Autor:
Michael Ingram, Bettina Nechay, Victor Veliadis, Sharon Woodruff, Chris Lavoie, Megan Snook, David Giorgi, Harold Hearne
Publikováno v:
IEEE Journal of Emerging and Selected Topics in Power Electronics. 4:767-771
SiC device area is presently limited by material and processing defects. To meet the large current handling requirements of power conditioning systems, paralleling of a large number of devices is required. This can increase cost and complexity throug
Publikováno v:
Microelectronics Reliability. 55:2516-2521
A root cause failure investigation was performed on anomalous (early) MIM capacitor failures on an HBT MMIC process. These failures were only observed on capacitors in the actual MMICs; process control monitor (PCM) capacitors were nominal. Multiple
Autor:
Eugene A. Imhoff, Stuart Davis, Bettina Nechay, Joseph M. White, Christian Lavoie, Megan Snook, Chris Kirby, Harold Hearne, Victor Veliadis, Sharon Woodruff
Publikováno v:
Materials Science Forum. :855-858
The multiple-zone junction termination extension (MJTE) is a widely used SiC edge termination technique that reduces sensitivity to implantation dose variations. It is typically implemented in multiple lithography and implantation events. To reduce p
Autor:
Victor Veliadis, Joseph M. White, Harold Hearne, Sharon Woodruff, Megan Snook, Bettina Nechay, Robert S. Howell, Stuart Davis, David Giorgi, Ty McNutt
Publikováno v:
Materials Science Forum. :961-964
To meet the large current handling requirements of modern power conditioning systems, paralleling of a large number of devices is required. This increases cost and complexity through dicing, soldering, and forming multiple wire bonds. Furthermore, pa
Autor:
Stuart Davis, Chris Kirby, Megan Snook, Sharon Woodruff, Harold Hearne, Bettina Nechay, Robert S. Howell, Ty McNutt, Joseph M. White, Victor Veliadis
Publikováno v:
Materials Science Forum. :977-980
The multi-zone junction termination extension (MJTE) is a widely used edge termination technique for achieving high voltage SiC devices. It is commonly implemented with multiple lithography and implantation events. In order to reduce process complexi
Autor:
Robert S. Howell, Stuart Davis, Harold Hearne, Sharon Woodruff, Victor Veliadis, Joseph M. White, Bettina Nechay, Ty McNutt, Megan Snook, David Giorgi
Publikováno v:
Materials Science Forum. :1171-1174
Modern power conditioning systems require large active area devices which can support high currents. Though the breakdown and thermal properties of SiC make it an excellent choice for power switching applications, active area size is currently limite
Autor:
Victor Veliadis, Damian Urciuoli, Aivars J. Lelis, Eric J. Stewart, Joshua D. Caldwell, Harold Hearne, Charles Scozzie, Robert S. Howell, Megan Snook, Wendi Chang
Publikováno v:
Materials Science Forum. :1013-1016
Electron-hole recombination-induced stacking faults have been shown to degrade the electrical characteristics of SiC power pin and MPS diodes and DMOSFETs with thick drift epitaxial layers. In this paper, we investigate the effects of bipolar injecti
Autor:
Eric J. Stewart, Victor Veliadis, Aivars J. Lelis, Harold Hearne, Charles Scozzie, Robert S. Howell
Publikováno v:
Materials Science Forum. :929-932
A recessed implanted-gate short-channel 1290-V normally-OFF 4H-SiC vertical-channel JFET (VJFET), fabricated in seven photolithographic-levels, with a single masked ion-implantation and no epitaxial regrowth, is evaluated for efficient power conditio
Publikováno v:
Materials Science Forum. :1147-1150
Bi-directional solid-state-circuit-breakers (SSCBs) are highly desirable in power-electronic fault-protection applications due to their high actuation speed and repeated fault isolation capability. Normally-on SiC vertical-channel JFETs (VJFETs) are
Publikováno v:
Materials Science Forum. :711-714
High-voltage vertical-junction-field-effect-transistors (VJFETs) are typically designed normally-on to ensure low-resistance voltage-control operation at high current-gain. To exploit the high-voltage/temperature capabilities of VJFETs in a normally-