Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Harold G. Linde"'
Publikováno v:
Sensors and Actuators A: Physical. 63:251-254
Data for the etch rates of passivating and non-passivating films are presented for the anisotropic etchant ethanolamine-gallic acid-water. Thesedataidentifyusefulmasking and conductive layers for
Publikováno v:
Journal of The Electrochemical Society. 144:3169-3174
This paper discusses the effect of varied humidity on lithographic performance during photoresist exposure. In the presence of water, exposure causes the sensitizer to be converted into acid; without water, a less soluble ester forms. The effect of h
Autor:
Harold G. Linde, Larry W. Austin
Publikováno v:
Sensors and Actuators A: Physical. 49:167-172
Heterocyclic amine catalysts used to accelerate the wet oxidation of 〈100〉 silicon in gallate-complexed aqueous amine etchant formulations include pyrazines, pyridazines, and N -conjugated triazoles, tetrazoles, and triazines. Faster oxidation re
Autor:
Larry W. Austin, Harold G. Linde
Publikováno v:
Sensors and Actuators A: Physical. 49:181-185
A wide variety of oxidative catalysts have been tested in altering the wet chemical etching of the three major crystal faces of silicon, using a solution of gallic acid—ethanolamine—water. Significant variations in etch selectivity occur, where b
Autor:
Charles A. Whiting, Jeff D. Towne, Kevin W. Collins, James A. Warner, Danny M. Plouff, Kurt R. Kimmel, Douglas E. Benoit, Susan Sonchik Marine, Jeffrey P. Lissor, Harold G. Linde
Publikováno v:
SPIE Proceedings.
This paper describes the evolution of a simple recirculating etch station into a successful x-ray mask membrane-etch station. The manufacturing etch station consists of a large, heated mix tank in which she ethanolamine solution is brought to reactio
Autor:
Harold G. Linde, Stephen. Meeks
Publikováno v:
Analytical Chemistry. 55:1443-1445
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