Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Hareen Gangala"'
Autor:
Marc Schaekers, Joseph J. Bendik, P. Gopalan, Will Conley, F. Zhang, M. Op de Beeck, Mircea Dusa, Kurt G. Ronse, Hareen Gangala
Publikováno v:
Microelectronic Engineering. 46:51-54
In this paper, various contributions to the reflection variation at the resist/BARL interface are investigated. Not only deviations in the optical parameters (n, k, thickness T) of the BARL are causing variations in reflectivity, but also thickness v
Publikováno v:
Microelectronic Engineering. 46:97-100
Deep-UV lithography using 248 and 193-nm light will likely be the microlithography technology of choice for the manufacture of advanced memory and logic semiconductor devices for the next decade. Since 193nm lithography development has been slow, the
Publikováno v:
Microelectronic Engineering. 46:59-63
This paper explores the concept of a variable threshold resist model (VTRM) where the model is trained with data from a specific resist process, and may be applied to lithography simulation for that resist process with a wide variety of optical expos
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 16:3398
We present the characterization of optical proximity effects and their correction for 0.18 μm deep-ultraviolet (UV) lithography processes using a semiempirically derived “behavior” model. Since critical dimension (CD) measurement data for derivi
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