Roughness Suppression in Electrochemical Nanoimprinting of Si for Applications in Silicon Photonics.

Autor: Sharstniou A; Arizona State University, School of Manufacturing Systems and Networks, 6075 S. Innovation Way West, Mesa, AZ, 85212, USA., Niauzorau S; Arizona State University, School of Manufacturing Systems and Networks, 6075 S. Innovation Way West, Mesa, AZ, 85212, USA., Hardison AL; Clemson University, Holcombe Department of Electrical and Computer Engineering, 91 Technology Drive, Anderson, SC, 29625, USA., Puckett M; Honeywell International, Aerospace Advanced Technology Advanced Sensors & Microsystems, 21111 N. 19th Avenue, Phoenix, AZ, 85027, USA., Krueger N; Honeywell International, Aerospace Advanced Technology Advanced Sensors & Microsystems, 12001 State Highway 55, Plymouth, MN, 55441, USA., Ryckman JD; Clemson University, Holcombe Department of Electrical and Computer Engineering, 91 Technology Drive, Anderson, SC, 29625, USA., Azeredo B; Arizona State University, School of Manufacturing Systems and Networks, 6075 S. Innovation Way West, Mesa, AZ, 85212, USA.

Publikováno v: Advanced materials (Deerfield Beach, Fla.) [Adv Mater] 2022 Oct; Vol. 34 (43), pp. e2206608. Date of Electronic Publication: 2022 Sep 27.