Zobrazeno 1 - 10
of 146
pro vyhledávání: '"Harald Suhr"'
Publikováno v:
Journal of Organometallic Chemistry. 514:23-28
Thin films of silicon carbide have been prepared by plasma enhanced chemical vapour deposition using Si(Si(CH3)3)4 as a precursor. This compound is stable against moisture and air and has a high vapour pressure. Furthermore, the compositions of the f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9a524296b297e81ca8410d16917f8538
https://doi.org/10.1016/0022-328x(95)06032-r
https://doi.org/10.1016/0022-328x(95)06032-r
Publikováno v:
Plasma Chemistry and Plasma Processing. 15:371-381
A Langomir probe investigation of Ar/H2/Cp2HfMe2 plasmas is described. The probe measurements were performed for various discharge conditions. The mean electron energy and electron density were measured for various power, gas flows of argon, and hydr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5c0494ee038a2b977ee6143b5312746
https://doi.org/10.1007/bf01650735
https://doi.org/10.1007/bf01650735
Publikováno v:
Applied Physics A Materials Science & Processing. 60:285-288
Thin films of hafnium carbide have been deposited by plasma-enhanced chemical vapor deposition using bis(η-cyclopentadienyl)dimethylhafnium, Cp2 Hf(CH3)2, as precursor in 13.56 MHz planar reactor. The influence of the various experimental parameters
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e063af0f9144a8dbbc4eb43a7d7c3343
https://doi.org/10.1007/bf01538404
https://doi.org/10.1007/bf01538404
Publikováno v:
Advanced Materials. 6:392-395
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7972c55db7f0401f266e022b7f718b65
https://doi.org/10.1002/adma.19940060512
https://doi.org/10.1002/adma.19940060512
Autor:
Harald Suhr, P. Špatenka
Publikováno v:
Plasma Chemistry and Plasma Processing. 13:555-566
A Langmuir probe investigation of Ar/O2/Al(OPr1)3 plasmas is described. The probe contamination depends on the probe position and the flow of tine carrier gases. Whereus far from the working gas inlet characteristics without any hysteresis were obtai
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::84a73f31313fa05fe0650bd17316a46d
https://doi.org/10.1007/bf01465882
https://doi.org/10.1007/bf01465882
Publikováno v:
Plasma Chemistry and Plasma Processing. 13:77-91
The dissociation of hydrogen sulfide has been studied in an atmospheric-pressure glow discharge rotating between concentric electrodes in an axial magnetic field. Though the electrodes were heated to remove the sulfur formed in the discharge, stable
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f3386a140001f93bc154c678f0edfa5e
https://doi.org/10.1007/bf01447171
https://doi.org/10.1007/bf01447171
Publikováno v:
ChemInform. 22
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e810bb19f746fbf5e261f6d909407c9
https://doi.org/10.1002/chin.199145304
https://doi.org/10.1002/chin.199145304
Publikováno v:
ChemInform. 24
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ccf406045dec67635830ebb7b76d8172
https://doi.org/10.1002/chin.199315303
https://doi.org/10.1002/chin.199315303
Publikováno v:
ChemInform. 25
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::16c2417c37c6ba9957482a2e822c2d9e
https://doi.org/10.1002/chin.199436276
https://doi.org/10.1002/chin.199436276