Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Harada Saburo"'
Publikováno v:
Emerging Patterning Technologies.
Nanoimprint lithography, NIL, is gathering much attention as one of the most potential candidates for the next generation lithography for semiconductor. This technology needs no pattern data modification for exposure, simpler exposure system, and sin
Publikováno v:
Alternative Lithographic Technologies VII.
Performances of the nanoimprint lithography templates were discussed considering the readiness toward the high volume manufacturing of nanoimprint lithography application along with the requirement for the templates and its fabrication process. The c
Publikováno v:
Japan Journal of Food Engineering. 5:197-204
Akademický článek
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Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 15:021006
Development of nanoimprint lithography (NIL) templates is discussed. The template fabrication process and its performance are presented with consideration of the requirements of NIL for high-volume manufacturing. Defectivity, image placement, and cri
Autor:
Bencher, Christopher, Cheng, Joy Y., Ichimura, Koji, Hikichi, Ryugo, Harada, Saburo, Kanno, Koichi, Kurihara, Masaaki, Hayashi, Naoya
Publikováno v:
Proceedings of SPIE; April 2017, Vol. 10144 Issue: 1 p101440D-101440D-1, 912962p
Autor:
Resnick, Douglas J., Bencher, Christopher, Ichimura, Koji, Yoshida, Kouji, Harada, Saburo, Nagai, Takaharu, Kurihara, Masaaki, Hayashi, Naoya
Publikováno v:
Proceedings of SPIE; March 2015, Vol. 9423 Issue: 1 p94230D-94230D-5, 848076p
Publikováno v:
Hydrobiologia; Jun2000, Vol. 429 Issue 1-3, p171, 9p, 4 Charts, 2 Graphs, 1 Map
Publikováno v:
Chemistry Letters; July 1987, Vol. 16 Issue: 7 p1371-1372, 2p