Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Haosen Tan"'
Autor:
Haosen Tan, Weida Zhang, Yudong Chen, Yuhe Xia, Chris Newey, Tso-Min Chou, Nai-Hsiang Sun, Jerome K. Butler, Gary A. Evans
Publikováno v:
IEEE Photonics Journal, Vol 14, Iss 6, Pp 1-10 (2022)
A simple thin film effective index analysis for first-order gratings in Si photonic waveguides is shown to provide highly accurate results for reflected and transmitted power spectrums as long as the waveguide remains single mode and non-radiating. A
Externí odkaz:
https://doaj.org/article/f109c095828c461c89785ad76fac35a1
Autor:
Haosen Tan, Weida Zhang, Yudong Chen, Yuhe Xia, Chris Newey, Tso-Min Chou, Nai-Hsiang Sun, Jerome K. Butler, Gary A. Evans
Publikováno v:
IEEE Photonics Journal, Vol 15, Iss 5, Pp 1-2 (2023)
We report errors in Table III of (Tan et al. 2022) that requires changing the text discussions in four places. These errors, due to using an incorrect thickness for the middle layer of a three-layer waveguide in an analytic formula (Huang et al., 201
Externí odkaz:
https://doaj.org/article/7b9aa45be9164e17987e2d5bab001ec2
Autor:
Yongjie Cui, Hung-Yu Chen, Shuoqi Chen, Douglas Linkhart, Haosen Tan, Jiangbin Wu, Soack Yoon, Michael Geiler, Anton Geiler, Edward Beam, Andy Xie, Nan Wang, Michael Regan, Mark Kruzich, Bruce Nguyen, Donald White, Andrew Ketterson, Cathy Lee, David Willis, Han Wang, Yu Cao
Publikováno v:
2021 IEEE International Electron Devices Meeting (IEDM).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a5588b915e79f553f70d1f651301ae6
https://doi.org/10.1109/iedm19574.2021.9720611
https://doi.org/10.1109/iedm19574.2021.9720611
Publikováno v:
Applied Physics A. 123
A new design of an orientation stage for scanning near-field lithography is presented based on flexure hinges. Employing flexure mechanisms in place of rigid-body mechanisms is one of the most promising techniques to efficiently implement high precis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1bb90769d684e7ffd15052c7eee53ca2
https://doi.org/10.1007/s00339-017-1204-y
https://doi.org/10.1007/s00339-017-1204-y