Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Hans-Juergen Kahlert"'
Autor:
Stuart Bashford, Berthold Burghardt, Jong Kab Park, Yili Guo, Young Key Kwon, Hans-Juergen Kahlert, Ian Baker, Johannes Richter, N. Hay
Publikováno v:
International Congress on Applications of Lasers & Electro-Optics.
A new high power laser optical system has been developed which is operated by pulsed, green, diode pumped solid state lasers. The design is based on multiplexing of lasers by fiber coupling and is scalable to power levels above 1.6kW. The combined hi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8325904d52b441f262fed74ab910edde
https://doi.org/10.2351/1.5062463
https://doi.org/10.2351/1.5062463
Publikováno v:
2006 Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference.
For future 65 nm and smaller nodes, thermal anneal processes in the ms and mus range are required. Based on laboratory tests using the line scan method, an R&D system has been developed.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::53a59aef10ee6464cd8b3181069b0c8d
https://doi.org/10.1109/cleo.2006.4628853
https://doi.org/10.1109/cleo.2006.4628853
Autor:
Frank Dipl.-Ing. Simon, Michael Dipl.-Phys. Dr. Stopka, Berthold Burghardt, Hans-Juergen Kahlert
Publikováno v:
SPIE Proceedings.
Crystallization of thin Si-films using excimer lasers is a well introduced technique to the manufacturing process of flat panel display poly-Si back plates. The crystallization is performed by a Line Beam exposure which is scanned with a typical over
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e6c04d6e86fd3f7a4f834e61562d7b55
https://doi.org/10.1117/12.479599
https://doi.org/10.1117/12.479599
Publikováno v:
SPIE Proceedings.
Industrial production of low temperature p-Si back plates for LCDs by high power excimer laser annealing was introduced several years ago. Regarding the economy of the process, one of the major advantages of excimer laser annealing is the opportunity
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4e163776063945d48ad9233233020ee9
https://doi.org/10.1117/12.476825
https://doi.org/10.1117/12.476825
Publikováno v:
SPIE Proceedings.
The most recent development in industrial fabrication processes of low temperature poly-silicon by means of excimer laser and optics system is presented: . The recently developed high performance excimer laser, which delivers the highest output power
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cc41523d6ec967edb3b3e5efa0c41576
https://doi.org/10.1117/12.481801
https://doi.org/10.1117/12.481801
Autor:
Berthold Burghardt, Thomas Schletterer, Hans-Juergen Kahlert, Johannes Schlichting, Kerstin Winkler, Lienhard Koerner
Publikováno v:
Current Developments in Lens Design and Optical Systems Engineering.
The productive and accurate ablation of microstructures demands the precise imaging of a mask pattern onto the substrate under work. The job can be done with high performance wide field lenses as a key component of ablation equipment. The image field
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e6b13de8c710a1a06b007b4e79a580f4
https://doi.org/10.1117/12.405225
https://doi.org/10.1117/12.405225
Publikováno v:
SPIE Proceedings.
Excimer laser micromachining applications have gained more and more interest in fabrication of commercial microstructure products (e.g. multi chip modules, printed circuit boards, excimer laser stripped wires and others). The unique properties of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c045476bfc5632e4996bac37410dfbe4
https://doi.org/10.1117/12.143034
https://doi.org/10.1117/12.143034
Publikováno v:
SPIE Proceedings.
The bandwidth requirements 1, 2, 3, 4, 5 on DUV 248 nm lithography laser sources, in general, are a function of a number of physical parameters. For example, the stepper lens, the image field size and the required resolution. The trend towards larger
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8579c089512ba4921cb1a6452e498c56
https://doi.org/10.1117/12.130371
https://doi.org/10.1117/12.130371
Publikováno v:
SPIE Proceedings.
Since 1987 commercial line narrowed 248 nm excimer lasers have been used with R&D DUV steppers. Several resonator concepts were employed to match linewidth power and lifetime needs for a DUV microlithography laser light source. The physics of differe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1c857d1fb91e1ae19bac3af596fefb35
https://doi.org/10.1117/12.44818
https://doi.org/10.1117/12.44818
Publikováno v:
Optical/Laser Microlithography III.
Commercially used lithography lasers are line narrowed KrF excimer lasers (Ref. 1) operated at (248.38 0.2) nm at 2 W (10 mJ, 200 Hz) with a bandwidth of typically 3 pm (Ref.2). A system control concept for alternative control at two different locati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7a04b3f5f16ea0b498c12b53ac514348
https://doi.org/10.1117/12.20205
https://doi.org/10.1117/12.20205