Zobrazeno 1 - 10
of 45
pro vyhledávání: '"Hans Lauth"'
Publikováno v:
Thin Solid Films. 335:1-5
The electrical and optical properties of indium tin oxide (ITO) thin films deposited by plasma ion-assisted evaporation are reported. With deposition at room temperature using certain ion-source parameters ITO films with an electrical resistivity of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::639995845eeff44c0368d9ebc70c9d40
https://doi.org/10.1016/s0040-6090(98)00861-x
https://doi.org/10.1016/s0040-6090(98)00861-x
Publikováno v:
Thin Solid Films. 192:27-39
Optical coatings of titania (TiO 2 ) and tantala (Ta 2 O 5 ) prepared by reactive r.f. diode and d.c. plasmatron sputtering were investigated for the influence of structural properties on the 1064 nm laser damage resistance. Using various methods of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c8b301ab350af0fc12c1333a31b05f9b
https://doi.org/10.1016/0040-6090(90)90476-t
https://doi.org/10.1016/0040-6090(90)90476-t
Autor:
Heiko Müller, Hans Lauth, Eberhard Welsch, P. Weissbrodt, Angela Duparré, Norbert Kaiser, J. Meyer, E. Hacker, Heinz-Günter Walther
Publikováno v:
Thin Solid Films. 187:275-288
Results of measurements of bulk scattering as well as absorption losses of evaporated ZrO2 single-layer films are presented. A special layer design was used to eliminate the losses originating from the film interfaces. The scattering and absorption m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6bd15a4bff2a272445a99ecfc73c3146
https://doi.org/10.1016/0040-6090(90)90049-j
https://doi.org/10.1016/0040-6090(90)90049-j
Autor:
Oliver Falkenstörfer, Stefan Müller-Pfeiffer, Wolfgang Seiferth, Hans Lauth, Thomas Weyh, Matthias Esselbach
Publikováno v:
Optifab 2007: Technical Digest.
The fast development of sensors with high sensitivity and growing pixel numbers for the IR range drives the development of suitable optical systems. This is enforced by the growing demands of the defense and security sector. JENOPTIK LASER, OPTIK, SY
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d8ec3e148bbe3017fd3e181429aa2b98
https://doi.org/10.1117/12.720214
https://doi.org/10.1117/12.720214
Publikováno v:
SPIE Proceedings.
Aside from steppers also inspection systems in the semiconductor industry as well as in micro material processing require DUV imaging optics with very high optical requirements. A test and adjustments set-up based on the Shack-Hartmann wave front sen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fb94dd8cf395452347d723343609adc3
https://doi.org/10.1117/12.712506
https://doi.org/10.1117/12.712506
Autor:
Uwe Birnbaum, Oliver Falkenstörfer, Helmut Bernitzki, Hans Lauth, Roland Schreiner, Thomas Waak
Publikováno v:
SPIE Proceedings.
Machining of aspheres represents an extra field in the manufacturing of optical components. The deviation from the sphere has a big impact on machining and testing equipment, tools and technologies, achievable specifications and costs. The production
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::53e6e931bfa73e4041e8864176c31385
https://doi.org/10.1117/12.674204
https://doi.org/10.1117/12.674204
Autor:
Hans Lauth, Oliver R. Falkenstoerfer, Sven Koehler, Uwe Birnbaum, Thomas Herrmann, J. Roeder, Roland Schreiner
Publikováno v:
SPIE Proceedings.
A small distinction of some micron makes an awful difference between spheres and aspheres. It takes special technological equipment to manufacture and test aspheric optics. This equipment is clearly distinguished from that for classical optics manufa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4890ab5e1e0f99cd38387425bbdf8a77
https://doi.org/10.1117/12.512933
https://doi.org/10.1117/12.512933
Publikováno v:
SPIE Proceedings.
The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithogra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b9054266e967d91990a521034501dc9b
https://doi.org/10.1117/12.512502
https://doi.org/10.1117/12.512502
Publikováno v:
Optifab 2003: Technical Digest.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::24f3f2b47dcd75fc31265abcc517a25e
https://doi.org/10.1117/12.2284021
https://doi.org/10.1117/12.2284021
Publikováno v:
Optifab 2003: Technical Digest.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::117b9c25693f616bb281cdb20fa1454e
https://doi.org/10.1117/12.2284007
https://doi.org/10.1117/12.2284007