Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Hans‐Dirk Löwe"'
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 6(1):58-64
A dual RF excited discharge is described. The dual RF excitation system provides a method to control the substrate self-bias without affecting the state of the discharge. The substrate can be RF-biased utilizing an appropriate excitation frequency an
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 5(4):337-346
An ultraclean (UC) magnetically enhanced reactive ion etcher (MERIE) is proposed to overcome the limitations of the present-state MERIE available commercially. The sensitivity of gas compositions, pumping speed, substrate temperature and magnetic fie
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 10:3048-3054
The influence of the excitation frequency in the parallel plate cathode‐coupling equipment has been investigated and it was found that the self‐bias voltage of the cathode becomes a logarithmic function of the excitation frequency in two distinct
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 9:3090-3099
Mean ion energy and ion flux have been investigated in a low‐pressure, radio frequency (rf) magnetron discharge (dual rf excitation plasma) as function of substrate rf power and frequency, plasma excitation rf power and process pressure. Electrical