Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Hannah Narcross"'
Autor:
Clifford L. Henderson, Laren M. Tolbert, Peter J. Ludovice, Hannah Narcross, Brandon L. Sharp
Publikováno v:
Journal of Vacuum Science & Technology B. 37:011604
Several 0.26N tetramethylammonium hydroxide (TMAH)-soluble epoxide molecular resists have been synthesized and are reported here. Previously, the patterning performance of 1,1,2,2-tetrakis(p-hydroxyphenyl)ethane-3 epoxide (TPOE-3Ep) was reported and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a2ef81a5799af67d1d4258aacf4765a6
https://doi.org/10.1116/1.5057741
https://doi.org/10.1116/1.5057741
Autor:
Hannah Narcross, Peter J. Ludovice, Laren M. Tolbert, Brandon L. Sharp, Clifford L. Henderson
Publikováno v:
Journal of Vacuum Science & Technology B. 36:06JC02
Controlling undesired polymerization in nominally unexposed regions is critical to achieving high-resolution, defect-free patterns when using negative tone molecular resists based on the crosslinking of epoxides. Two onium salt additives, a photodeco
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c4e3e93be79249f8e7e7a02d61379dfc
https://doi.org/10.1116/1.5057442
https://doi.org/10.1116/1.5057442
Autor:
Clifford L. Henderson, Hannah Narcross, Brandon L. Sharp, Richard A. Lawson, Ashten Fralick, Mark Neisser, Laren M. Tolbert, Jun Sung Chun
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
A negative tone, aqueous base developable molecular glass resist, 3Ep, is presented that is developable in both standard organic solvents and aqueous base developers. The resist shows slightly better imaging performance in organic solvent versus aque
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a12e65a76f7a3e86a6b4014b7ef8696e
https://doi.org/10.1117/12.2086039
https://doi.org/10.1117/12.2086039
Autor:
Hannah Narcross, Jun Sung Chun, Richard A. Lawson, Clifford L. Henderson, Laren M. Tolbert, Brandon L. Sharp, Mark Neisser
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Many different types of non-traditional resist designs have shown promise for future generations of patterning, but there is a greater need for understanding and developing additives and ancillary materials for these novel resists compared to traditi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::23a45412a94c6d577179717781438b6e
https://doi.org/10.1117/12.2086007
https://doi.org/10.1117/12.2086007
Autor:
Jun Sung Chun, Laren M. Tolbert, Clifford L. Henderson, Brandon L. Sharp, Mark Neisser, Hannah Narcross, Richard A. Lawson
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
A series of five negative tone epoxide functionalized molecu lar resists have been synthesized and have had their glass transition temperature ( e ) and lithographic contrast behavior characterized. Introducing rigid structural features in the form o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fcc6dd7e84cfbde96d544414ba5da8f4
https://doi.org/10.1117/12.2086027
https://doi.org/10.1117/12.2086027
Crosslinkable photoacid generators for ultrahigh loading in epoxide functionalized molecular resists
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35:06GE02
A series of ionic onium salt photoacid generators (PAGs) functionalized with epoxide or phenolic groups capable of participating in the cationic polymerization of epoxides have been synthesized and investigated for use in ultrahigh PAG loaded negativ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6dd7798526ebec8f082e7afc8b873674
https://doi.org/10.1116/1.4991894
https://doi.org/10.1116/1.4991894
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35:06GE03
Presented here is 1,1,1-tris(4-hydroxyphenyl) ethane (THPE)-2VE, a phenol-containing depolymerization resist that demonstrates a 248-nm deep ultraviolet sensitivity (dose-to-clear) of 3 mJ/cm2 as well as a contrast ratio of 7.2 when formulated with 5
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0fa7b697f3402f95b8fc7da4b9f32888
https://doi.org/10.1116/1.4991904
https://doi.org/10.1116/1.4991904