Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Hank Shimizu"'
Autor:
Mark Raynor, Dan Alvarez, Russell J. Holmes, Keisuke Andachi, Jeffrey J. Spiegelman, Hank Shimizu
Publikováno v:
2017 28th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
A novel hydrazine vaporization source has been developed in response to the emerging need for sub-400°C metal nitride deposition. Hydrazine has been demonstrated to be a viable precursor to enable low temperature atomic layer deposition (ALD). Initi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c5280f5b7bf136d35b60368fcad2205
https://doi.org/10.1109/asmc.2017.7969274
https://doi.org/10.1109/asmc.2017.7969274
Autor:
Jeffrey J. Spiegelman, Daniel Alvarez, Mark Raynor, Keisuke Andachi, Hank Shimizu, Russell J. Holmes
Publikováno v:
ECS Meeting Abstracts. :1273-1273
Introduction Next generation channel materials (SiGe, Ge and InGaAs) place very difficult thermal constraints ( SiN passivation layers on new channel materials SiN sidewall spacers and contact etch stop layers TiN for metal gate electrodes TiN or WN
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1467aa1127155f52f2222acff2dbeb6b
https://doi.org/10.1149/ma2017-01/26/1273
https://doi.org/10.1149/ma2017-01/26/1273