Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Hamid R. Khorram"'
Autor:
Mina Ohadi, Masoud Arabfard, Safoura Khamse, Samira Alizadeh, Sara Vafadar, Hadi Bayat, Nahid Tajeddin, Ali M. A. Maddi, Ahmad Delbari, Hamid R. Khorram Khorshid
Publikováno v:
Biology Direct, Vol 19, Iss 1, Pp 1-16 (2024)
Abstract Background The recombination landscape and subsequent natural selection have vast consequences forevolution and speciation. However, most of the crossover and recombination hotspots are yet to be discovered. We previously reported the releva
Externí odkaz:
https://doaj.org/article/be81404a23d745afa5f70dc67adc4506
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Autor:
N. Sagawa, Y. Iriuchijima, T. Hayashi, T. Sei, T. Takahiro, K. Nakamura, T. Fujiwara, Kenichi Shiraishi, Hamid R. Khorram, Katsushi Nakano
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 25:63-71
From the initial stages of immersion lithography development, through mainstream manufacturing today, topcoat processes have been utilized. However, the complexity and extra cost associated with the topcoat layer has motivated the industry as a whole
Publikováno v:
2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Reducing time to market and cost-of-ownership is essential to MEMS makers. Therefore, lithography tools that continue to provide new, flexible, and versatile substrate alignment solutions, including backside alignment capabilities, are crucial factor
Autor:
Jumpei Fukui, Volker Berghof, Shigeo Mizoroke, Tetsuji Onuki, Hamid R. Khorram, Makoto Osanai, Susumu Hagiwara
Publikováno v:
2012 SEMI Advanced Semiconductor Manufacturing Conference.
Similar to IC manufacturing, Cost of Ownership (CoO) and enhanced productivity are key focus areas for Microelectromechanical Systems (MEMS), Light Emitting Diodes (LED) and Air Bearing Surface (ABS) manufacturers. Here also, cost reduction can be ac
Autor:
Hamid R. Khorram
Publikováno v:
2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.
Increasing demand in technology requirements from IC manufacturers has necessitated that photolithography equipment suppliers design and build tools with many advanced capabilities. These additional features not only add to the complexity of the tool
Autor:
Yuuki Ishii, Yasuhiro Iriuchijima, Natsuko Sagawa, Katsushi Nakanob, Hamid R. Khorram, Tadamasa Kawakubo, Shirou Nagaoka, Tomoharu Fujiwara
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
Immersion lithography has gone through its first phase of introduction and acceptance as the main solution for critical layer lithography for 45nm node and beyond. In this phase, the industry has found that immersion technology has its own unique cha