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Layer-Controlled Growth of Single-Crystalline 2D Bi2O2Se Film Driven by Interfacial Reconstruction

Autor: Kang, Minsoo, Jeong, Han Beom, Shim, Yoonsu, Chai, Hyun-Jun, Kim, Yong-Sung, Choi, Minhyuk, Ham, Ayoung, Park, Cheolmin, Jo, Min-kyung, Kim, Tae Soo, Park, Hyeonbin, Lee, Jaehyun, Noh, Gichang, Kwak, Joon Young, Eom, Taeyong, Lee, Chan-Woo, Choi, Sung-Yool, Yuk, Jong Min, Song, Seungwoo, Jeong, Hu Young, Kang, Kibum

Publikováno v: ACS Nano; January 2024, Vol. 18 Issue: 1 p819-828, 10p

Direct Growth of Bi2SeO5Thin Films for High-k Dielectrics via Atomic Layer Deposition

Autor: Park, Hyeonbin, Hwang, Jae Hun, Oh, Seung Hoon, Ryu, Jin Joo, Jeon, Kanghyeok, Kang, Minsoo, Chai, Hyun-Jun, Ham, Ayoung, Kim, Gun Hwan, Kang, Kibum, Eom, Taeyong

Publikováno v: ACS Nano; 20240101, Issue: Preprints

Layer-Controlled Growth of Single-Crystalline 2D Bi 2 O 2 Se Film Driven by Interfacial Reconstruction.

Autor: Kang M; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea., Jeong HB; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea., Shim Y; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea., Chai HJ; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea., Kim YS; Korea Research Institute of Standards & Science (KRISS), Daejeon 34113, Republic of Korea., Choi M; Opernado Methodology and Measurement Team, Korea Research Institute of Standards & Science (KRISS), Daejeon 34113, Republic of Korea., Ham A; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea., Park C; School of Electrical Engineering, Graphene/2D Materials Research Center, Center for Advanced Materials Discovery towards 3D Display, Korea Advanced Institute of Science and Technology (KAIST) 291, Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea., Jo MK; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.; Opernado Methodology and Measurement Team, Korea Research Institute of Standards & Science (KRISS), Daejeon 34113, Republic of Korea., Kim TS; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea., Park H; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.; Thin Film Materials Research Center, Korea Research Institute of Chemical Technology (KRICT) 141, Gajeong-ro, Daejeon 34114, Republic of Korea., Lee J; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea., Noh G; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.; Center for Neuromorphic Engineering, Korea Institute of Science and Technology (KIST), Seoul 02792, Republic of Korea., Kwak JY; Center for Neuromorphic Engineering, Korea Institute of Science and Technology (KIST), Seoul 02792, Republic of Korea., Eom T; Thin Film Materials Research Center, Korea Research Institute of Chemical Technology (KRICT) 141, Gajeong-ro, Daejeon 34114, Republic of Korea., Lee CW; Computational Science & Engineering Laboratory, Korea Institute of Energy Research, Daejeon 34129, Republic of Korea., Choi SY; School of Electrical Engineering, Graphene/2D Materials Research Center, Center for Advanced Materials Discovery towards 3D Display, Korea Advanced Institute of Science and Technology (KAIST) 291, Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea., Yuk JM; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea., Song S; Opernado Methodology and Measurement Team, Korea Research Institute of Standards & Science (KRISS), Daejeon 34113, Republic of Korea., Jeong HY; Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea., Kang K; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.; Graduate School of Semiconductor Technology, Korea Advanced Institute of Science and Technology (KAIST) 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.

Publikováno v: ACS nano [ACS Nano] 2024 Jan 09; Vol. 18 (1), pp. 819-828. Date of Electronic Publication: 2023 Dec 28.