Zobrazeno 1 - 10
of 60
pro vyhledávání: '"Haiyong Gao"'
Publikováno v:
Journal of Materials Chemistry A. 8:10845-10854
Amongst various gaseous pollutants, NO2 is one of the major exhausts originating from fossil fuel and gas combustions in vehicle engines and power plants at high temperature. Under such a scenario, in situ and real-time gas detection and monitoring s
Autor:
Woong Jae Chung, Blandine Minghetti, Rajan Mali, Gregory Hart, Pavan Samudrala, Nyan Aung, Lokesh Subramany, Haiyong Gao, Seva Khikhlovskyi, Pieter Heres, Yen-Jen Chen
Publikováno v:
2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Wafers at FBEOL layers traditionally have higher stress and larger alignment signal variability. ASML's ATHENA sensor based scanners, commonly used to expose FBEOL layers, have large spot size (∼700um). Hence ATHENA captures the signal from larger
Autor:
Juan Manuel Gomez, Woong Jae Chung, Kevin Jock, Haiyong Gao, Yen-Jen Chen, Bono Park, Ian Krumanocker, Nyan Aung, Yue Zhou, Guanchen He, Pavan Samudrala, Xueli Hao, Karsten Gutjahr, Darius Brown, Wenle Gao, Michael Hsieh, DeNeil Park
Publikováno v:
Optical Microlithography XXXI.
We demonstrate high volume manufacturing feasibility of 7 nm technology overlay correction requirement. This stateof- the-art overlay control is achieved by (i) overlay sampling optimization and advanced modeling, (ii) alignment and advanced process
Autor:
Pavan Samudrala, Shawn Lee, Blandine Minghetti, Lokesh Subramany, Delvigne Erik Henri Adriaan, Woong Jae Chung, Haiyong Gao, Seung Chul Oh, Nyan Aung
Publikováno v:
SPIE Proceedings.
With continuous shrink in feature dimensions, overlay tolerance for fabrication of transistors is getting more stringent. Achieving good overlay is extremely critical in getting good yield in HVM environment. It is widely understood that good alignme
Autor:
Nyan Aung, Pavan Samudrala, Gregory Hart, Woong Jae Chung, Blandine Minghetti, Haiyong Gao, Seva Khikhlovskyi, Yen-Jen Chen, Rajan Mali, Lokesh Subramany, Pieter Heres
Publikováno v:
SPIE Proceedings.
Wafers at FBEOL layers traditionally have higher stress and larger alignment signal variability. ASML’s ATHENA sensor based scanners, commonly used to expose FBEOL layers, have large spot size (~700um). Hence ATHENA captures the signal from larger
Publikováno v:
Applied Surface Science. 296:53-60
A variety of stannate nanostructures have been fabricated for UV photocatalysis, including zinc- and cadmium-based stannates. As the template nanostructures, high surface-area mesoporous metal hydroxystannate [ZnSn(OH) 6 and CdSn(OH) 6 ] nanoparticle
Autor:
Hom N. Sharma, Wen Xiao, Yanbing Guo, Zheng Ren, Caihong Liu, Pu-Xian Gao, Haiyong Gao, A.B. Mhadeshwar
Publikováno v:
Nano Energy. 2:873-881
Constructed with parallel or honeycomb channels micrometer to millimeter in diameter, monolithic catalysts and reactors have been utilized in various business sectors ranging from mechanical, automotive, fine chemicals, pharmaceutical, to biotechnolo
Autor:
Nyan Aung, Pavan Samudrala, Haiyong Gao, Blandine Minghetti, Woong Jae Chung, Lokesh Subramany, Shawn Lee, Juan Manuel Gomez
Publikováno v:
SPIE Proceedings.
To further shrink the contact and trench dimensions, Negative Tone Development (NTD) has become the de facto process at these layers. The NTD process uses a positive tone resist and an organic solvent-based negative tone developer which leads to impr
Autor:
Yong Ding, Chang-Yong Nam, Hui Jan Lin, Pu-Xian Gao, John P. Baltrus, Paul R. Ohodnicki, Haiyong Gao
Publikováno v:
ACS applied materialsinterfaces. 8(14)
Noble metal nanoparticles are extensively used for sensitizing metal oxide chemical sensors through the catalytic spillover mechanism. However, due to earth-scarcity and high cost of noble metals, finding replacements presents a great economic benefi
Autor:
Bill Pierson, Woong Jae Chung, Lipkong Yap, Dongsuk Park, Patrick Snow, Juan Manuel Gomez, Nyan Aung, John C. Robinson, Lokesh Subramany, Karsten Gutjahr, Onur N. Demirer, Haiyong Gao, Pavan Samudrala, Miguel Garcia-Medina
Publikováno v:
SPIE Proceedings.
In recent years overlay (OVL) control schemes have become more complicated in order to meet the ever shrinking margins of advanced technology nodes. As a result, this brings up new challenges to be addressed for effective run-to- run OVL control. Thi