Zobrazeno 1 - 10
of 205
pro vyhledávání: '"Hagelaar, G.J.M."'
Autor:
Douai, D., Kogut, D., Wauters, T., Brezinsek, S., Hagelaar, G.J.M., Hong, S.H., Lomas, P.J., Lyssoivan, A., Nunes, I., Pitts, R.A., Rohde, V., de Vries, P.C.
Publikováno v:
In Journal of Nuclear Materials August 2015 463:150-156
Autor:
Pancheshnyi, S., Biagi, S., Bordage, M.C., Hagelaar, G.J.M., Morgan, W.L., Phelps, A.V., Pitchford, L.C.
Publikováno v:
In Chemical Physics 4 April 2012 398:148-153
Speeding Up Fluid Models for Gas Discharges by Implicit Treatment of the Electron Energy Source Term
Autor:
Hagelaar, G.J.M., Kroesen, G.M.W.
Publikováno v:
In Journal of Computational Physics 20 March 2000 159(1):1-12
Autor:
Janssen, J.F.J., Zatsarinny, O., Bartschat, K., Hagelaar, G.J.M., Dijk, van, J., Pitchford, L.C.
Publikováno v:
67th Annual Gaseous Electronics Conference, GEC2014, 2-7 November 2014, Raleigh, North Carolina, United States
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::771653cbc278af4dad52ffc313157140
https://research.tue.nl/nl/publications/f7ae100d-38e5-4f71-8701-09af88026513
https://research.tue.nl/nl/publications/f7ae100d-38e5-4f71-8701-09af88026513
Autor:
Ayubi, Bilal Iqbal1 (AUTHOR) d2019065@mail.sdu.edu.cn, Zhang, Li1 (AUTHOR) zhleee@sdu.edu.cn, Zhou, Shengrui1 (AUTHOR), Wang, Yiwei1 (AUTHOR), Zou, Liang1 (AUTHOR)
Publikováno v:
Polymers (20734360). Sep2024, Vol. 16 Issue 17, p2450. 18p.
Autor:
Nowakowska, Helena1 (AUTHOR) dczylkowski@imp.gda.pl, Czylkowski, Dariusz1 (AUTHOR), Hrycak, Bartosz1 (AUTHOR), Jasiński, Mariusz1 (AUTHOR)
Publikováno v:
Materials (1996-1944). Sep2024, Vol. 17 Issue 17, p4369. 18p.
Publikováno v:
Proceedings 19th International Symposium on Plasma Chemistry (ISPC 19), 26-31 July 2009, Bochum, Germany, P1.5.21-1
STARTPAGE=P1.5.21;ENDPAGE=1;TITLE=Proceedings 19th International Symposium on Plasma Chemistry (ISPC 19), 26-31 July 2009, Bochum, Germany
STARTPAGE=P1.5.21;ENDPAGE=1;TITLE=Proceedings 19th International Symposium on Plasma Chemistry (ISPC 19), 26-31 July 2009, Bochum, Germany
No abstract.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::7a11495153a858d2b20896950d3f0191
https://research.tue.nl/nl/publications/fb47c8d5-8225-4e5f-944d-5beb16760aa0
https://research.tue.nl/nl/publications/fb47c8d5-8225-4e5f-944d-5beb16760aa0
Autor:
Mihailova, D.B., Dijk, van, J., Hagelaar, G.J.M., Brok, W.J.M., Grozeva, M., Mullen, van der, J.J.A.M.
Publikováno v:
Proceedings of the 11th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-11 2009), 13-14 November 2008, Kerkrade, The Netherlands
only
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::8ac708ec303fe99966adbd71c2d1c3b3
https://research.tue.nl/nl/publications/90783b99-9859-4a95-b686-69715c5c31b8
https://research.tue.nl/nl/publications/90783b99-9859-4a95-b686-69715c5c31b8
Publikováno v:
Program of the 52nd Annual Gaseous Electronics Conference, 18-18
STARTPAGE=18;ENDPAGE=18;TITLE=Program of the 52nd Annual Gaseous Electronics Conference
STARTPAGE=18;ENDPAGE=18;TITLE=Program of the 52nd Annual Gaseous Electronics Conference
PALC (Plasma Addressed Liquid Crystal) is one of the most promising technologies for large size flat panel displays. In this technology micro-discharges are used as electrical switches for the addressing of a liquid crystal layer. In view of the smal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::937c933a5b2c019cd63849920f57758b
https://research.tue.nl/nl/publications/bc668cd3-4eb0-4a7f-b78d-12827525c245
https://research.tue.nl/nl/publications/bc668cd3-4eb0-4a7f-b78d-12827525c245