Functionalization of the SiO 2 Surface with Aminosilanes to Enable Area-Selective Atomic Layer Deposition of Al 2 O 3 .

Autor: Xu W; Department of Chemical and Biological Engineering, Colorado School of Mines, Golden, Colorado 80401, United States., Haeve MGN; Department of Applied Physics, Eindhoven University of Technology, Eindhoven 5600MB, The Netherlands., Lemaire PC; Lam Research Corporation, 11155 SW Leveton Drive, Tualatin, Oregon 97062, United States., Sharma K; Lam Research Corporation, 11155 SW Leveton Drive, Tualatin, Oregon 97062, United States., Hausmann DM; Lam Research Corporation, 11155 SW Leveton Drive, Tualatin, Oregon 97062, United States., Agarwal S; Department of Chemical and Biological Engineering, Colorado School of Mines, Golden, Colorado 80401, United States.

Publikováno v: Langmuir : the ACS journal of surfaces and colloids [Langmuir] 2022 Jan 18; Vol. 38 (2), pp. 652-660. Date of Electronic Publication: 2022 Jan 06.