Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Hae-geun Jee"'
Publikováno v:
Applied Surface Science. 258:2201-2205
The intermediates of thermal decomposition of 1,3-disilabutane (SiH 3 CH 2 SiH 2 CH 3 , DSB) to form SiC on Si(1 0 0) surface were in situ investigated by reactive ion scattering (RIS), temperature programmed reactive ion scattering (TPRIS), temperat
Publikováno v:
Surface Science. 605:649-653
Adsorption and desorption of fullerene on a single layer of graphene grown on SiC(0001) were investigated by photoemission spectroscopy (PES). No significant change in the band structure of graphene was observed after fullerene deposition on the grap
Publikováno v:
Vacuum. 85:65-68
Influence of oxygen adsorption on CO chemisorption behavior over W(110) surfaces was studied using valence band spectra and thermal desorption spectroscopy (TDS). In the absence of O, CO formed a tilted and a vertical structure at 120 K on W(110). In
Autor:
B. Kim, Hae-geun Jee, Young Dok Kim, C. C. Hwang, Jung Hoon Han, Sung-Kee Chung, Han-Na Hwang
Publikováno v:
Surface Science. 604:853-856
Synchrotron radiation based photoemission spectroscopy (SRPES) and low energy electron diffraction (LEED) are used to study the interaction between Ag atoms and the Si(1 1 1)1 × 1–H surface. At an Ag coverage of 0.063 monolayers (ML) on the Si(1 1
Publikováno v:
Bulletin of the Korean Chemical Society. 30:1353-1356
This study examined the adsorption of CO on a Mo(110) surface by Thermal Desorption Spectroscopy (TDS) and synchrotron-radiation based photoemission spectroscopy (SRPES). CO desorption was observed at approximately 400 K (α-CO) and > 900 K (β-CO).
Autor:
Gyung Hee Lee, Young Dok Kim, Jin-Hyo Boo, Hyun Seok Han, Soon-Bo Lee, Hae-geun Jee, Taek-seung Yang
Publikováno v:
Bulletin of the Korean Chemical Society. 29:1115-1120
). Tilted structures have been suggested to be precursorsof dissociative chemisorption; however, experimental evidence is provided for the non-dissociativechemisorption of CO at temperatures above 900 K (which is referred to as the β-state): TDS sho
Autor:
Han-Na Hwang, Chan-Cuk Hwang, Jun Lim, Young Dok Kim, Harun H. Solak, Jin-Hee Han, Hae-geun Jee, Hyun-Joon Shin
Publikováno v:
ACS nano. 4(9)
Most researchers expect extreme ultraviolet lithography (EUVL) to be used to create patterns below 32 nm in semiconductor devices. An ultrathin EUV photoresist (PR) layer a few nanometers thick is required to further reduce the minimum feature size.
Autor:
Soon Bo Lee, Ji-Beom Yoo, Jong Bae Park, Haeseong Lee, Jin-Hyo Boo, Jin Seung Lee, Chongho Kim, Hae-geun Jee, Seong Kyu Kim
Publikováno v:
Journal of nanoscience and nanotechnology. 5(2)
We report a new method to produce ordered arrays of metal nanostructures on substrates. The method employs a through-hole nanoporous alumina membrane as a mask that is attached onto the substrate, silicon in this study. The material of deposition, Au
Autor:
Jin-Hee Han, Young Dok Kim, Hee-seob Kim, Bongsoo Kim, Hae-geun Jee, Han-Na Hwang, Chan-Cuk Hwang
Publikováno v:
Applied Physics Letters. 95:093107
We report that pentacene can be used as a protection layer of graphene using synchrotron radiation-based photoemission spectroscopy. When pentacene was deposited on a single layer graphene, molecular states of pentacene were clearly observed, yet no
Autor:
Hae-geun Jee, Jin-Hee Han, Han-Na Hwang, Bongsoo Kim, Hee-seob Kim, Young Dok Kim, Chan-Cuk Hwang
Publikováno v:
Applied Physics Letters; 8/31/2009, Vol. 95 Issue 9, p093107, 3p, 3 Graphs