Zobrazeno 1 - 10
of 89
pro vyhledávání: '"HAROLD F. WINTERS"'
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 25:96-103
The purpose of this article is to present evidence about the quantity and distribution of fluorine in silicon after and during spontaneous etching with F atoms, F2, and XeF2. X-ray photoelectron spectroscopy spectra were analyzed using the method dev
Autor:
Alan C. Luntz, Harold F. Winters
Publikováno v:
The Journal of Chemical Physics. 101:10980-10989
The dissociative sticking S0 for CH4, C2H6, and their deuterated analogs has been measured on Pt(110) as a function of surface temperature Ts under thermal ‘‘bulb’’ conditions at low gas pressures (Tg=300 K). Large increases in S0 with Ts are
Publikováno v:
Journal of Applied Physics. 76:1228-1243
Modulated‐beam mass spectrometry and x‐ray photoelectron spectroscopy (XPS) have been used to investigate the interaction of CH4, C2H4, C5H10, and H2 with carburized and uncarburized tungsten. It is shown that significant evaporation of C1, C2, a
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 11:657-663
It has been recognized since the 1960’s that bombardment of a growing thin film by energetic particles strongly influences film properties. Particle bombardment has generally been accomplished by accelerating ions into the growing film. However, it
Autor:
J. W. Coburn, Harold F. Winters
Publikováno v:
ChemInform. 23
Basic studies of the surface science aspects of plasma-assisted etching were initiated over 10 years ago in laboratories throughout the world. Several approaches to this experimentally challenging problem have been taken: (1) simulate the reactive ga
Autor:
Alan C. Luntz, Harold F. Winters
Publikováno v:
ChemInform. 26
The dissociative sticking S0 for CH4, C2H6, and their deuterated analogs has been measured on Pt(110) as a function of surface temperature Ts under thermal ‘‘bulb’’ conditions at low gas pressures (Tg=300 K). Large increases in S0 with Ts are
Publikováno v:
Applied Physics A Solids and Surfaces. 55:274-278
The energy transferred to a copper surface by bombardment with Xe+, Ar+, and He+ ions with kinetic energies in the range 100–4000 eV has been studied by our group in previous experiments. There were significant experimental uncertainties for that d
Autor:
J. W. Coburn, Harold F. Winters
Publikováno v:
Surface Science Reports. 14:162-269
Basic studies of the surface science aspects of plasma-assisted etching were initiated over 10 years ago in laboratories throughout the world. Several approaches to this experimentally challenging problem have been taken: (1) simulate the reactive ga
Publikováno v:
Physical Review B. 44:4747-4758
The energy deposited into carbon, silicon, copper, silver, and gold surfaces by ${\mathrm{He}}^{+}$, ${\mathrm{Ar}}^{+}$, and ${\mathrm{Xe}}^{+}$ ions impinging with kinetic energy in the range 100--4000 eV has been measured. These studies employed a
Publikováno v:
MRS Proceedings. 235
It has been recognized since the 1960's that bombardment of a growing thin film by energetic particles strongly influences film properties. Particle bombardment has generally been accomplished by accelerating ions into the growing film. However, it h