Zobrazeno 1 - 10
of 30
pro vyhledávání: '"H.-D Mohring"'
Autor:
F. H. Klotz., H.-D. Mohring, T. Bruton, M. Alonso Abella, P. Tzanetakis, M. Gasson, C. Gruel, J. Sherborne
Publikováno v:
Sixteenth European Photovoltaic Solar Energy Conference
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::05c8150ec0e057600f07c618c7f613e0
https://doi.org/10.4324/9781315074405-42
https://doi.org/10.4324/9781315074405-42
Autor:
C.K. Weatherby, R.W. Bentley, G.R. Whitfield, Juan C. Miñano, E Alarte-Garvi, P Keuber, A.C Hunt, H.-D Mohring, F.H Klotz
Publikováno v:
Scopus-Elsevier
Spreadsheets have been used to compare some 90 possible small PV concentrator designs that might be suitable for use at remote sites. They have apertures of about 2 m2, use BP Solar LBG cells, and employ small aperture modules to reduce heat sinking
Publikováno v:
Journal of Non-Crystalline Solids. :195-198
Structural changes have been studied as a function of deposition temperature Ts in intrinsic a-Si:H and a-Ge:H. Bond angle disorder as indicated by the halfwidth of the transverse optic (TO) like Raman band is minimized at Ts ≈ 500K in a-Ge:H from
Publikováno v:
Journal of Non-Crystalline Solids. :847-850
Intrinsic a-SiC:H films with optical bandgaps E g ≤ 2.0 eV have been optimized with respect to minimum PDS Urbach energy E 0 . We demonstrate that the increasing density of midgap defects induced by C incorporation controls AM1 photoconductivity at
Publikováno v:
Journal of Non-Crystalline Solids. :745-748
A novel plasma jet technique has been applied for a-Ge:H film deposition basing upon the excitation of nobel/inert gases like He, Ar, or H2 by a large area dielectric barrier ac-discharge. The spatial distribution of radicals generated from GeH4 has
Publikováno v:
The Conference Record of the Twenty-Second IEEE Photovoltaic Specialists Conference - 1991.
Intrinsic a-SiC:H thin films with optical bandgaps E/sub g/
Publikováno v:
MRS Proceedings. 258
Infrared (ir) spectroscopy is used to investigate the structural properties of a-SiC:H in a wide compositional range and as a function of film thickness. Hydrogen content NH increases considerably with increasing carbon fraction. For low carbon alloy
Publikováno v:
MRS Proceedings. 192
A vacuum UV-photo-CVD reactor for direct decomposition of Si2H6, SiH4, GeH4, and B2H6 for a-Si:H, a-Ge:H, and a-SiGe:H deposition has been operated with a large area dielectric-barrier discharge lamp emitting excimer radiation of Xe (7.3eV), Kr (8.6e
Publikováno v:
Journal of Non-Crystalline Solids. :1415-1418
Hydrogenated amorphous SiC films have been p-type doped in an alternative process which is based upon plasma enhanced boron diffusion (PAD) from thin SiB layers on the substrate into the growing intrinsic film. In contrast to B2H6 doped films showing