High-throughput scanning probe instruments for nanopatterning, alignment, and overlay metrology

Autor: Abbas Mohtashami, M.H. van Es, V. Navarro, R.W. Herfst, D. Piras, K. Maturova, H. Sadeghian Marnani

Publikováno v: Novel Patterning Technologies, San Jose, CA, USA, 26 February-1 March 2018, Sanchez, M.I.Panning, E.M., 10584

As the pitch approaches the 10nm node, in order to meet current and future patterning challenges, high resolution techniques are required, complementary to extreme ultraviolet lithography (EUVL) for high volume manufacturing of nanodevices. These com

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::89e96f3b39a717d7fbcca10df65ddccc
http://resolver.tudelft.nl/uuid:5f35fec0-b3e1-417d-94c8-27a8677f3164

Helium ion beam induced growth of hammerhead AFM probes

Autor: E. van Veldhoven, H. Sadeghian Marnani, Diederik Maas, Paul F. A. Alkemade, Gaurav Nanda

Publikováno v: Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures, 33 (6), 2015
Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 6, 33

The authors report the direct-write growth of hammerhead atomic force microscope (AFM) probes by He+ beam induced deposition of platinum-carbon. In order to grow a thin nanoneedle on top of a conventional AFM probe, the authors move a focused He+ bea

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a5131bf3b49b934981bcbaa6d3efd6bd
http://resolver.tudelft.nl/uuid:0239f9cc-0df8-44c7-981e-0403ae3189c3

Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.