Phase optimization of thermally actuated piezoresistive resonant MEMS cantilever sensors

Autor: A. Setiono, M. Fahrbach, J. Xu, M. Bertke, W. O. Nyang'au, G. Hamdana, H. S. Wasisto, E. Peiner

Publikováno v: Journal of Sensors and Sensor Systems, Vol 8, Pp 37-48 (2019)

The asymmetric resonance response in thermally actuated piezoresistive cantilever sensors causes a need for optimization, taking parasitic actuation–sensing effects into account. In this work, two compensation methods based on Wheatstone bridge

Externí odkaz: https://doaj.org/article/e16b5aa32c7d4b24b4c55e27d9bf55be

Biomechanics on Ultra‐Sensitivity of Venus Flytrap's Micronewton Trigger Hairs.

Autor: Wang, Kejun¹ (AUTHOR), Chen, Siyuan¹ (AUTHOR), Bao, Guanyu¹ (AUTHOR), Sun, Tao² (AUTHOR), Zhang, Junqiu² (AUTHOR), Chen, Daobing³ (AUTHOR), Sun, Lining¹ (AUTHOR), Han, Zhiwu² (AUTHOR), Liu, Chao¹ (AUTHOR) c.liu@suda.edu.cn, Wang, Qian¹ (AUTHOR) qianwang@suda.edu.cn

Publikováno v: Advanced Science. 11/6/2024, Vol. 11 Issue 41, p1-10. 10p.

Bio‐Inspired Electrodes with Rational Spatiotemporal Management for Lithium‐Ion Batteries.

Autor: Song, Zelai^1,2 (AUTHOR), Li, Weifeng^1,2 (AUTHOR) liweifeng@jlu.edu.cn, Gao, Zhenhai^1,2 (AUTHOR) gaozh@jlu.edu.cn, Chen, Yupeng³ (AUTHOR) ypchen0727@buaa.edu.cn, Wang, Deping⁴ (AUTHOR), Chen, Siyan^1,2 (AUTHOR)

Publikováno v: Advanced Science. 7/24/2024, Vol. 11 Issue 28, p1-46. 46p.

Unlocking High-Current Performance in Silicon Anode: Synergistic Phosphorus Doping and Nitrogen-Doped Carbon Encapsulation to Enhance Lithium Diffusivity.

Autor: Firdaus AM; Materials Science and Engineering Research Group, Faculty of Mechanical and Aerospace Engineering, Institut Teknologi Bandung, Jl. Ganesha 10, Bandung, 40132, Indonesia., Hawari NH; Materials Science and Engineering Research Group, Faculty of Mechanical and Aerospace Engineering, Institut Teknologi Bandung, Jl. Ganesha 10, Bandung, 40132, Indonesia., Adios CG; Materials Science and Engineering Research Group, Faculty of Mechanical and Aerospace Engineering, Institut Teknologi Bandung, Jl. Ganesha 10, Bandung, 40132, Indonesia., Nasution PM; Materials Science and Engineering Research Group, Faculty of Mechanical and Aerospace Engineering, Institut Teknologi Bandung, Jl. Ganesha 10, Bandung, 40132, Indonesia., Peiner E; Institute of Semiconductor Technology (IHT) and Laboratory for Emerging Nanometrology (LENA), Technische Universität Braunschweig, Hans-Sommer-Straße 66, Braunschweig, 38106, Germany., Wasisto HS; PT Nanosense Instrument Indonesia, Umbulharjo, Yogyakarta 55167, Indonesia., Sumboja A; Materials Science and Engineering Research Group, Faculty of Mechanical and Aerospace Engineering, Institut Teknologi Bandung, Jl. Ganesha 10, Bandung, 40132, Indonesia.; Research Collaboration Center for Advanced Energy Materials, Institut Teknologi Bandung, Jl. Ganesha 10, Bandung, 40132, Indonesia.

Publikováno v: Chemistry, an Asian journal [Chem Asian J] 2024 Apr 02; Vol. 19 (7), pp. e202400036. Date of Electronic Publication: 2024 Mar 13.

Recent advances in plasma etching for micro and nano fabrication of silicon-based materials: a review.

Autor: Li, Chaojiang, Yang, Yuxin, Qu, Rui, Cao, Xun, Liu, Guodong, Jin, Xin, Liu, Yuxuan, Liu, Shenggui, Jiang, Wang, Zhang, Xianchao

Publikováno v: Journal of Materials Chemistry C; 12/7/2024, Vol. 12 Issue 45, p18211-18237, 27p