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Slow coarsening of ultra-confined phase-separated glass thin films

Autor: B. Bouteille, J. T. Fonné, E. Burov, E. Gouillart, H. Henry, H. Montigaud, P. Jop, D. Vandembroucq

Publikováno v: Applied Physics Letters. 120:051602

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::41f1906c88359fca71b255d773357542
https://doi.org/10.1063/5.0079056

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Characterization of the porosity of silicon nitride thin layers by Electrochemical Impedance Spectroscopy

Autor: Bernard Tribollet, Thomas Barrès, Boinet Mickael, O. Stephan, H. Montigaud, Y. Cohin

Publikováno v: Electrochimica Acta
Electrochimica Acta, Elsevier, 2017, 227, pp.1-6. ⟨10.1016/j.electacta.2017.01.008⟩
Electrochimica Acta, 2017, 227, pp.1-6. ⟨10.1016/j.electacta.2017.01.008⟩

International audience; Silicon nitride thin films are widely used as diffusion barriers within stacks in the glass industry but turn out to be porous at the nanometric scale. EIS measurements were conducted on SiNx thin layers deposited on a gold la

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::830cd2d4f58b0aa44b2b5cd733d24806
https://hal.archives-ouvertes.fr/hal-01452732/document

Carbon nitrides: A challenge for the solid state chemist?

Autor: G. Hug, S. Courjault, Gérard Demazeau, B. Tanguy, M. Jaouen, H. Montigaud

Publikováno v: High Pressure Research. 18:245-249

Materials containing light elements and characterized by a dense structure present specific physico-chemical properties. The carbonitrides CxNy, and in particular C3N4, have attracted the attention of the scientific community during these last ten ye

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5bddbfdeed54b1c520d2cd2b0f30f7d7
https://doi.org/10.1080/08957950008200975