Zobrazeno 1 - 7
of 7
pro vyhledávání: '"H. M. Marchman"'
Autor:
G C Wetsel, H M Marchman
Publikováno v:
Nanotechnology. 6:93-100
An optically guided scanned probe has been used to establish electrical contact with and obtain electrical characteristics of individual, identifiable nanostructures. Previous reports of measurements of the electrical characteristics of nanostructure
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d6a9836c7b6a963b6f92ea3d02dcd79
https://doi.org/10.1088/0957-4484/6/3/004
https://doi.org/10.1088/0957-4484/6/3/004
Publikováno v:
Review of Scientific Instruments. 65:2538-2541
The fabrication of cylindrical probes having diameters as small as 50 nm is described in this article. The planar endface (advantageously oriented perpendicular to the axis of the cylindrical probe) and sharp 90° corners of the end portion of the pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4e8585877b7c4a02043abcbad89fac3d
https://doi.org/10.1063/1.1144648
https://doi.org/10.1063/1.1144648
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 13:1100
Dimensional measurement of surface topography with a probe microscope requires surface proximity sensing, probe position measurement, a probe with known shape, and careful analysis of the image generated. Our probe microscope contains some novel feat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5aa5ab5fbcb53b09411653af4fab94d
https://doi.org/10.1116/1.587910
https://doi.org/10.1116/1.587910
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12:3567
A fundamental requirement in critical dimension measurement is determination of the edge positions. Edge position measurement can be degraded by many sources of error, the probe‐sample interaction usually being the most important of them. In most c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7a507e79e688cc348ebbd958be5c92a3
https://doi.org/10.1116/1.587472
https://doi.org/10.1116/1.587472
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12:3585
Increased performance of lithographic process techniques has been the key enabler for the continued reduction of minimum device feature sizes down to 0.25 μm and beyond. However, this increase in performance has been accompanied by the added fabrica
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::565f7b3e90cc62bd662d3ce386fb0c4d
https://doi.org/10.1116/1.587476
https://doi.org/10.1116/1.587476
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 11:2473
Profilometry of high‐aspect‐ratio, submicron lithographic features with a scanning force microscope is possible if the instrument satisfies several requirements. The probe must be slender enough to reach into narrow holes without sacrificing stab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a8a43ea2e47309b2fe51f4ea29f866f
https://doi.org/10.1116/1.586649
https://doi.org/10.1116/1.586649
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 11:2482
Metrology test reticles that include a wide variety of structures typically encountered on phase‐shifting masks were fabricated using a subtractive process. The test masks have been used to assess the ability of metrology instruments to measure lin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b33bd44c275a0828df1bd11891d06766
https://doi.org/10.1116/1.586651
https://doi.org/10.1116/1.586651