Zobrazeno 1 - 10
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pro vyhledávání: '"H. Freller"'
Autor:
H Freller
Publikováno v:
Vacuum. 45:997-1000
The processes of vapour-phase deposition such as CVD and PVD are of growing importance for the production of high-grade coatings. Plasma- and ion-assisted processes especially have successfully expanded into the field of hard coatings against wear an
Publikováno v:
Thin Solid Films. 241:71-75
Investigations concerning the development of a chemical vapour deposition process for the structures deposition of titanium nitride coatings onto tool steel at low substrate temperatures are presented. In order to stimulate local film growth of hard
Autor:
H Freller
Publikováno v:
Surface and Coatings Technology. :148-153
Autor:
H. Freller, H.P. Lorenz
Publikováno v:
Materials Science and Engineering: A. 140:534-538
Tin was deposited on high speed tool steel (1.3343) by use of different plasma chemical vapour deposition (PCVD) methods. R.f. PCVD without and with a d.c. substrate bias, d.c. PCVD, pulsed d.c. PCVD and downstream microwave plasma excitation were us
Autor:
H. Freller, H. P. Lorenz
Publikováno v:
Eurocourses: Mechanical and Materials Science ISBN: 9789048142149
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fa059175c5dd89354a598554d0d1dfb8
https://doi.org/10.1007/978-94-017-0631-5_11
https://doi.org/10.1007/978-94-017-0631-5_11
Autor:
H.P. Lorenz, H. Freller
Publikováno v:
Beschichten mit Hartstoffen ISBN: 9783642958274
Die in den letzten Jahren erzielten Fortschritte bei der Absenkung der Abscheidetemperatur haben die Anwendungsbreite von Hartstoffschichten entscheidend erweitert. Zwischen der Anwendung und ihren spezifischen Belastungen und Verschleismechanismen e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::70f3d4d989eb5277338952396ff8d946
https://doi.org/10.1007/978-3-642-95826-7_2
https://doi.org/10.1007/978-3-642-95826-7_2
Publikováno v:
Thin Solid Films. 241:xi
Publikováno v:
CIRP Annals. 37:165-169
New complex coatings are discussed, which can be adapted to individual applications on special tools in the Field of chipless forming and to product components. This broadening of technological possibilities was achieved by substantial progress in PV
Autor:
K.G. Günther, H. Freller
Publikováno v:
Thin Solid Films. 88:291-307
Molecular beam epitaxy (MBE) is a highly sophisticated method of obtaining thin semiconducting compound films of high quality. This technique is now very helpful not only in the preparation of many new devices but also in solid state science and the