Zobrazeno 1 - 10
of 50
pro vyhledávání: '"H. Endert"'
Autor:
Volker Quaschning, Bert Stegemann, M. Schüle, H. Endert, Hans-Ulrich Pahl, F. Fink, Jürgen Niederhofer, Christof Schultz
Publikováno v:
Laser Technik Journal. 9:25-29
Lasers are increasingly being used as an efficient and reliable tool in the production of solar cells and solar modules. Particular interest exists in thin-film photovoltaics, where laser structuring is aimed to realize appropriate monolithic serial
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e26d8857ea2bf170e2f646473c3a1d4
https://doi.org/10.1002/latj.201290004
https://doi.org/10.1002/latj.201290004
Autor:
H. Endert, Jürgen Niederhofer
Publikováno v:
Laser Technik Journal. 8:25-28
Even in established Photovoltaics (PV) production processes, such as laser structuring of thin-film cells, there is always a need for further improvement. In a new scribing concept, several compact lasers replace high-power lasers. This approach simp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::997d3c865768e3416edf0aed55917bb5
https://doi.org/10.1002/latj.201090103
https://doi.org/10.1002/latj.201090103
Autor:
S.M. Green, A. Koch, F.X. Wagner, H. Endert, L.A. Knauss, Hans M. Christen, Michael Scaggs, K. S. Harshavardhan
Publikováno v:
Applied Surface Science. :477-480
A beam homogenizer has been used in combination with a standard pulsed laser deposition (PLD) system. This combination reproducibly resulted in laser spots of precisely predetermined shapes and energy densities, thus providing control over one of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e6df58d0775a6bca534456aa979aabee
https://doi.org/10.1016/s0169-4332(97)00677-6
https://doi.org/10.1016/s0169-4332(97)00677-6
Publikováno v:
Microelectronic Engineering. 27:221-224
Excimer laser steppers are used since 1988 and performance has improved significantly over the years. To meet the demands on output power and spectral purity of advanced deep ultraviolet (DUV) optical lithography tools, a new laser cavity and line na
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::825b99ab96fc83650dd31c58fa62fa6a
https://doi.org/10.1016/0167-9317(94)00093-a
https://doi.org/10.1016/0167-9317(94)00093-a
Publikováno v:
Applied Physics A: Materials Science & Processing. 69:S305-S307
The use of F2 excimer laser sources, emitting at 157 nm, constitutes a new promising tool for scientific, industrial and lithography applications. The 157-nm laser emission enables high-resolution processes and the high photon energy offers the uniqu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ac3c0eb4ffe862f5082b3cae2f6e856
https://doi.org/10.1007/s003390051405
https://doi.org/10.1007/s003390051405
Autor:
H. Endert
Publikováno v:
Digest IEEE/Leos 1996 Summer Topical Meeting. Advanced Applications of Lasers in Materials and Processing.
Since their initial demonstration 20 years ago, excimer lasers have developed from physicists' "toys" to powerful tools, offering unique benefits to a wide range of applications. Nearly all technical (plastics, ceramics, glasses, metals, semiconducto
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1994c66c54590eab5b5858370c598b5e
https://doi.org/10.1109/leosst.1996.540664
https://doi.org/10.1109/leosst.1996.540664
Publikováno v:
AIP Conference Proceedings.
The short wavelength radiation (193‐351 nm) of excimer lasers makes them an excellent noncontact tool for processing metals, plastics and ceramics. The high photon energy and the very short duration of the excimer pulses can efficiently initiate ph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4554d1699db63737097ecc87eeafd7a6
https://doi.org/10.1063/1.44864
https://doi.org/10.1063/1.44864
Autor:
Eckhart Förster, M. P. Kalashnikov, A. V. Rode, K. Goetz, W.-D. Zimmer, H. Endert, J. A. Mikhailov, G. V. Sklizkov
Publikováno v:
Physica Status Solidi (a). 68:483-488
X-ray diffraction topographs from lattice defects in CaF2-crystals are produced with 0.5 nm X-ray pulses with 2.5 ns exposure time. The further development of this technique opens new and promising applications for time-resolved X-ray topography. Mit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::35f8fe501c285a222f435a5bd7a4b437
https://doi.org/10.1002/pssa.2210680218
https://doi.org/10.1002/pssa.2210680218
Publikováno v:
Optics Communications. 27:403-406
Calculations are presented for the case of the interference of incident and reflected light waves at the scratch flanks causing a decrease of the damage threshold. It is shown that the experimental damage results in Exp. Tech. Phys. 26 (1978) 175 can
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ce5479ec69352dcc7a28d4d21a0ee834
https://doi.org/10.1016/0030-4018(78)90409-1
https://doi.org/10.1016/0030-4018(78)90409-1
Publikováno v:
Kristall und Technik. 16:815-819
The dislocation density in KDP crystals has been determined by X-ray diffraction topography (LANG method). A method for determining the laser damage thresholds in dependence on dislocation density is described. It is found that dislocations with a de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f843b72396e7169ac5cf7b72c225ad18
https://doi.org/10.1002/crat.2170160713
https://doi.org/10.1002/crat.2170160713