Zobrazeno 1 - 4
of 4
pro vyhledávání: '"H. B. Bhandari"'
Autor:
M. Gaowei, Z. Ding, S. Schubert, H. B. Bhandari, J. Sinsheimer, J. Kuehn, V. V. Nagarkar, M. S. J. Marshall, J. Walsh, E. M. Muller, K. Attenkofer, H. J. Frisch, H. Padmore, J. Smedley
Publikováno v:
APL Materials, Vol 5, Iss 11, Pp 116104-116104-7 (2017)
Advanced photoinjectors, which are critical to many next generation accelerators, open the door to new ways of material probing, both as injectors for free electron lasers and for ultra-fast electron diffraction. For these applications, the nonunifor
Externí odkaz:
https://doaj.org/article/cbce70bab26d49eb86f98d91d69958a0
Publikováno v:
MRS Advances. 8:173-176
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b1b3ea264b5708c40056abe370db2a6
https://doi.org/10.1557/s43580-023-00508-2
https://doi.org/10.1557/s43580-023-00508-2
Publikováno v:
MRS Advances. 8:183-187
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6a73030cc486177365823ac738e70ba6
https://doi.org/10.1557/s43580-022-00423-y
https://doi.org/10.1557/s43580-022-00423-y
Publikováno v:
Applied Physics Letters. 85:1574-1576
Hafnium oxide dielectric thin films were deposited by metalorganic chemical vapor deposition with Hf (IV) t-butoxide and either an O2, N2, or N2O plasma in a 1:1 ratio with helium. Films approximately 5nm thick were analyzed using angle-resolved x-ra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ea17fa855e168fd2de1ca0fb8ee883b2
https://doi.org/10.1063/1.1785856
https://doi.org/10.1063/1.1785856