Zobrazeno 1 - 10
of 10
pro vyhledávání: '"H. A. van Daal"'
Autor:
Marleen G. A. M. van der Velde, Merel J. van der Aa, Merel H. C. van Daal, Marjolein N. T. Kremers, Carolina J. P. W. Keijsers, Sander M. J. van Kuijk, Harm R. Haak
Publikováno v:
BMC Geriatrics, Vol 22, Iss 1, Pp 1-10 (2022)
Abstract Background A variety of prediction models concerning COVID-19 have been proposed since onset of the pandemic, but to this date no gold standard exists. Mortality rates show a sharp increase with advancing age but with the large heterogeneity
Externí odkaz:
https://doaj.org/article/bb45598e74104083a71b2f09ac14051d
Publikováno v:
Water Distribution Systems Analysis 2008.
Quantitative risk analysis is used by various water companies, but mainly for aboveground assets for water treatment and pumping. Quantitative risk analysis is less frequently practiced for underground water distribution networks, as the condition of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b76d8228cb19e05884ef1e67f842e3b9
https://doi.org/10.1061/41024(340)56
https://doi.org/10.1061/41024(340)56
Autor:
J. G. M. Scharenberg, Bruce G. Jenks, Gerard J. M. Martens, A. P. van Overbeeke, J. H. H. N. van Daal
Publikováno v:
Journal of Endocrinology. 98:19-34
This report concerns biosynthetic studies conducted with neurointermediate lobes of the mouse pituitary gland. High performance liquid chromatography was used to resolve newly synthesized peptides after in-vitro incubation of lobes with radioactive a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bebb21fc0fc417eaa56c96bd4c476d14
https://doi.org/10.1677/joe.0.0980019
https://doi.org/10.1677/joe.0.0980019
Publikováno v:
Journal of Applied Physics. 32:2225-2233
Measurements of Hall effect and resistivity up to 1300°K on p‐type hexagonal SiC showed an acceptor level for aluminium of 0.27 ev at zero donor concentration and a not yet identified acceptor level of 0.39 ev. The spin multiplicity of this unknow
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b9048ec10d696658e08a776b67147d4f
https://doi.org/10.1063/1.1777048
https://doi.org/10.1063/1.1777048
Autor:
H. J. van Daal
Publikováno v:
Journal of Applied Physics. 39:4467-4469
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83aa3937ac67ddd17e5b34a403e1b010
https://doi.org/10.1063/1.1656998
https://doi.org/10.1063/1.1656998
Autor:
H. H. Brongersma, H. Schmidbaur, J. P. M. Schmitt, L. J. M. Guimarães, H. J. van Daal, S. A. Solems, M. Kleefstra, F. Cramarossa, A. S. Verlinde, G. H. Bauer, E. Fogarassy, C. Roch, G. Winterling, G. De Rosny, D. Rapakoulias, P. Nagels, J. L. Norenza, G. Willeke, L. Delgado, R. Gislon, G. Sardin, P. Siffert, J. Bullot, O. Maris, J. W. Metselaar
Publikováno v:
Photovoltaic Power Generation ISBN: 9789401078214
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f915b869644b8328ba89e90ac0f8b55c
https://doi.org/10.1007/978-94-009-2933-3_1
https://doi.org/10.1007/978-94-009-2933-3_1
Publikováno v:
Seventh E.C. Photovoltaic Solar Energy Conference ISBN: 9789401081986
A comparison will be made of three surface analysis techniques, viz. LEIS (NODUS), SIMS and AES, applied to an As doped Si02/Si interface. The purpose is to determine the profiles of 0, Si and As across the interface. These profiles will be made whil
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac26d6b532441fc741144bb4e4d20d7c
https://doi.org/10.1007/978-94-009-3817-5_199
https://doi.org/10.1007/978-94-009-3817-5_199
Autor:
H. J. van Daal, K.H.J. Buschow
Publikováno v:
AIP Conference Proceedings.
The temperature dependence of the electrical resistivity and the magnetic susceptibility has been investigated for the compounds UAl2, UAl3 and the isostructural compounds UX3 (X=Ga, In, Si, Ge, Sn), and finally for UAl4 and UGa2. The influence of a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::db465842360375a0cdcf2c187b6a15cd
https://doi.org/10.1063/1.2953895
https://doi.org/10.1063/1.2953895