Micromachined Joule-Thomson coolers

Autor: P. P. P. M. Lerou, H. J. M. ter Brake, H. V. Jansen, J. F. Burger, H. J. Holland, H. Rogalla, J. G. Weisend, John Barclay, Susan Breon, Jonathan Demko, Michael DiPirro, J. Patrick Kelley, Peter Kittel, Arkadiy Klebaner, Al Zeller, Mark Zagarola, Steven Van Sciver, Andrew Rowe, John Pfotenhauer, Tom Peterson, Jennifer Lock

Publikováno v: Advances in Cryogenic Engineering: Transactions of the Cryogenic Engineering Conference-CEC 2007, 614-621
STARTPAGE=614;ENDPAGE=621;TITLE=Advances in Cryogenic Engineering

A MEMS-based Joule-Thomson cold stage was designed and prototypes were realized and tested. The cold stage consists of a stack of three glass wafers. In the top wafer, a high-pressure channel is etched that ends in a flow restriction with a height of

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a6d044efa9e1190bba7ee55d0de31d6f
https://research.utwente.nl/en/publications/a72f6403-2c88-4060-b81e-5b33bb603da1

A capacitive RF power sensor based on MEMS technology.

Autor: L J Fernndez, R J Wiegerink, J Flokstra, J Ses, H V Jansen, M Elwenspoek

Publikováno v: Journal of Micromechanics & Microengineering; Jul2006, Vol. 16 Issue 7, p1099-1107, 9p

Chemically anisotropic single-crystalline silicon nanotetrahedra.

Autor: J W Berenschot, N R Tas, H V Jansen, M Elwenspoek

Publikováno v: Nanotechnology; Nov2009, Vol. 20 Issue 47, p475302-475302, 1p

Black silicon method: X. A review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next generation equipment.

Autor: H V Jansen, M J de, S Unnikrishnan, M C Louwerse, M C Elwenspoek

Publikováno v: Journal of Micromechanics & Microengineering; Mar2009, Vol. 19 Issue 3, p33001-33001, 1p