Zobrazeno 1 - 10
of 64
pro vyhledávání: '"H S Uhm"'
Publikováno v:
New Journal of Physics, Vol 17, Iss 11, p 113031 (2015)
Heavy water (D _2 O) is introduced into a non-thermal plasma jet (NTPJ) device to generate deuterium monoxide (OD) radicals instead of hydroxyl (OH) radicals. An NTPJ generated from a vapor mixture of N _2 /H _2 O and N _2 /D _2 O is applied to a cel
Externí odkaz:
https://doaj.org/article/8c201f64977245238ceb13bfaa099a14
Autor:
C. H. Son, I. W. Seo, D. H. Kim, I. T. Kim, M. S. Yun, H. S. Uhm, G. C. Kwon, K. A. Lee, G. S. Cho, T. H. Jo, E. H. Choi
Publikováno v:
Journal of the Korean Vacuum Society. 21:333-341
Indium Tin Oxide (ITO) thin films were prepared by RF magnetron sputtering with different flow rates of gas from 0 to 12 sccm. Electrical and optical properties of these films were characterized and analyzed. ITO deposited on soda lime glass and RF p
Publikováno v:
IEEE Transactions on Plasma Science. 38:3429-3433
Based on a simple circuit model, the global properties of the electrical discharge in a capillary discharge system are investigated by analyzing the breakdown electron temperature in terms of the applied voltage. The electrical charge and current flo
Publikováno v:
Journal of the Korean Physical Society. 54:2297-2301
A single ridge cavity was designed for the 60 kw, 915 MHz uniform atmospheric microwave plasma source which does not need an igniter for the initial discharge. The single ridge cavity in the shape of a resonator was built in the grid structures for t
Autor:
H. S. Uhm, Sun-Kuen Hwang
Publikováno v:
Metals and Materials International. 10:113-121
A Monte-Carlo computer simulation code was developed to study grain growth characteristics during thin film deposition. The simulation algorithm was based on the minimization of the sum of the anisotropic surface energy and grain boundary energy. The
Publikováno v:
Physics of Plasmas. 9:2831-2838
The electron energy distribution functions and plasma parameters in various gas mixture discharges (N2,O2,CF4/He,Ar,Xe) are measured. When He is mixed, the electron temperature increases but the electron density is almost constant. The electron tempe
Publikováno v:
Applied Physics Letters. 80:3907-3909
We control the ion density ratio of [N+]/[N2+] and investigate the relation between the ion ratio and the plasma parameters in inductively coupled plasma. We measure the electron energy distribution functions and the ion ratio in a N2/He,Ar,Xe mixtur
Publikováno v:
Applied Physics Letters. 79:1596-1598
The electron energy distribution functions and electron temperatures are measured in Ar/He and Ar/Xe inductively coupled plasma with various mixing ratios. The electron temperature does not change linearly with the mixing ratios; instead it increases
Publikováno v:
New Journal of Physics. 17:113031
Heavy water (D2O) is introduced into a non-thermal plasma jet (NTPJ) device to generate deuterium monoxide (OD) radicals instead of hydroxyl (OH) radicals. An NTPJ generated from a vapor mixture of N2/H2O and N2/D2O is applied to a cell membrane comp
Publikováno v:
Plasma Physics and Controlled Fusion. 57:075002
The generation of betatron radiations by laser-accelerated electron beams is of great interest in the scientific community as it has many applications. In this paper, we propose a new method for the generation of short wavelength betatron radiations.