Zobrazeno 1 - 10
of 38
pro vyhledávání: '"H N Shah"'
Autor:
Dhaval Vartak, Yogesh Ghotekar, Pina Bhatt, Bharat Makwana, B. Satyanarayana, H. N. Shah, Jitendra Vadher
Publikováno v:
Composites: Mechanics, Computations, Applications: An International Journal. 13:21-30
Autor:
H N, Shah
Publikováno v:
Journal of Postgraduate Medicine
Autor:
R. Jayaganthan, H N Shah
Publikováno v:
Journal of Materials Engineering and Performance. 21:2002-2009
CrAlN (0
Publikováno v:
IOSR Journal of Mechanical and Civil Engineering. 2:01-05
Atomic force microscope (AFM) is successfully utilized to image a broad range of thin film specimens because it can image nonconductive and soft material. Since the invention of the AFM, a lot of progress has been made in imaging thin films. Operatio
Publikováno v:
Materials & Design. 32:2628-2634
CrN and CrSiN coatings were deposited on stainless steel substrate by reactive magnetron sputtering. The coatings were characterized for phases, chemical composition, microstructure, and mechanical properties by X-ray diffraction (XRD), field emissio
Publikováno v:
Applied Surface Science. 257:5535-5543
CrSiN coatings were deposited on stainless steel (Grade: SA304) and silicon Si(1 0 0) substrates, with varying argon–nitrogen gas proportions and deposition temperature, using reactive magnetron sputtering technique in the present work. The influen
Publikováno v:
Surface Engineering. 26:629-637
Chromium nitride thin films were deposited on Si(100) substrate by using DC magnetron sputtering and the influence of process parameters such as substrate temperature, pressure and power on their microstructural characteristics were investigated in t
Publikováno v:
Surface Engineering. 26:596-601
The effect of deposition time, power (Si concentration) and sputtering pressure on the microstructural morphologies and phase compositions of sputter deposited CrSiN the thin films was investigated by filed emission SEM/EDS, AFM and XRD in the presen
Publikováno v:
Thin Solid Films. 518:5762-5768
Chromium nitride thin films were deposited on SA-304 stainless steel substrates by using direct-current reactive magnetron sputtering. The influence of process conditions such as nitrogen content in the fed gas, substrate temperature, and different s
Publikováno v:
Materials Chemistry and Physics. 121:567-571
CrN and CrSiN films were deposited on the stainless steel and silicon substrates by DC magnetron sputtering and their microstructural features were investigated by X-ray diffraction (XRD), scanning electron microscope (FE-SEM/EDS), and atomic force m