Zobrazeno 1 - 10
of 38
pro vyhledávání: '"H Caquineau"'
Publikováno v:
AIP Advances, Vol 6, Iss 10, Pp 105111-105111-20 (2016)
Cyclic formation of dust nanoparticles in hexamethyldisiloxane (HMDSO, Si2O(CH3)6)-argon RF discharge with pulsed injection of HMDSO was studied using time-resolved mass spectrometry (MS) and optical emission spectroscopy (OES). A large amount of C2H
Externí odkaz:
https://doaj.org/article/92a7212340e3494e90c7dc9ed78b8e0f
Publikováno v:
Journal of Computational Physics. 281:473-492
We develop a finite volume method based on unstructured triangular and/or quadrangular meshes for the numerical modeling of gas discharges at atmospheric pressure. The discretization of the computational domain is performed with median-dual control-v
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::643e2d8062eb8fe32208368f48061ca5
https://doi.org/10.1016/j.jcp.2014.10.031
https://doi.org/10.1016/j.jcp.2014.10.031
Publikováno v:
AIP Advances
AIP Advances, American Institute of Physics-AIP Publishing LLC, 2016, 6 (10), pp.105111. ⟨10.1063/1.4966254⟩
AIP Advances, Vol 6, Iss 10, Pp 105111-105111-20 (2016)
AIP Advances, American Institute of Physics-AIP Publishing LLC, 2016, 6 (10), pp.105111. ⟨10.1063/1.4966254⟩
AIP Advances, Vol 6, Iss 10, Pp 105111-105111-20 (2016)
Cyclic formation of dust nanoparticles in hexamethyldisiloxane (HMDSO, Si2O(CH3)6)-argon RF discharge with pulsed injection of HMDSO was studied using time-resolved mass spectrometry (MS) and optical emission spectroscopy (OES). A large amount of C2H
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bee0c6b75c3991ea4c9e99b052ade566
https://hal.archives-ouvertes.fr/hal-02448285
https://hal.archives-ouvertes.fr/hal-02448285
Publikováno v:
Journal of Physics D: Applied Physics. 40:2045-2054
In this paper, a microscopic approach for the calculation of partial and total power dissipation from energy losses by collisions is considered and applied in the case of N2O low pressure RF discharges. This approach is based on a Monte Carlo techniq
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9409bd8da28e2483cff2545c88695691
https://doi.org/10.1088/0022-3727/40/7/029
https://doi.org/10.1088/0022-3727/40/7/029
Publikováno v:
Journal of Physics D: Applied Physics. 38:4290-4295
The power dissipation in radiofrequency (RF) discharges in N2O–He mixtures was measured as a function of He dilution in N2O at two different gas pressures and several RF voltages. The maximum of power dissipation as a function of the helium dilutio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c4fd10a081e0a34dd475fd88e77bdac
https://doi.org/10.1088/0022-3727/38/24/004
https://doi.org/10.1088/0022-3727/38/24/004
Publikováno v:
Thin Solid Films. 471:53-62
Silicon oxide thin films were deposited at low temperatures by Plasma-Enhanced Chemical Vapour Deposition (PECVD) from silane–nitrousoxide (SiH 4 –N 2 O) and silane–nitrous oxide–helium (SiH 4 –N 2 O–He) mixtures. The film structure is sh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3f90404b8b67b86960ee0a1b080b42f4
https://doi.org/10.1016/j.tsf.2004.04.063
https://doi.org/10.1016/j.tsf.2004.04.063
Publikováno v:
Polymer Engineering and Science
Polymer Engineering and Science, Wiley-Blackwell, 2003, 43 (4), pp.798-808. ⟨10.1002/pen.10066⟩
Polymer Engineering and Science, Wiley-Blackwell, 2003, 43 (4), pp.798-808. ⟨10.1002/pen.10066⟩
The formation of polymer films produced by the phase separation process occurring when a cast poly(etherimide)/N-Methyl-2-Pyrrolidone solution was exposed to humid air was studied. It was found that above a relative humidity value of 27%, the films p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::14242cfad1e15ccf8c580e4c6dae3ac2
https://doi.org/10.1002/pen.10066
https://doi.org/10.1002/pen.10066
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Publikováno v:
Journal of Physics D: Applied Physics. 33:1332-1341
The present work concerns the experimental and theoretical analysis of the electrical behaviour and N2O/SiH4 dissociation of a classical RF discharge used for SiO2 thin-film deposition. Electric and deposition rate measurements are undertaken at 0.5
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e29474015abdea5a21dfe3bcd0f02a21
https://doi.org/10.1088/0022-3727/33/11/312
https://doi.org/10.1088/0022-3727/33/11/312
Publikováno v:
Journal of Physics D: Applied Physics. 32:1478-1488
In situ diagnostic measurements and reactor modelling are used to study the N2O dissociation by radio frequency (RF) discharges. Measurements are undertaken at 0.5 and 1 Torr gas pressure with a RF power density varying from 4.2 to 35.7 mW cm-2. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2818cef1eabcc5c10db9476b526f80ab
https://doi.org/10.1088/0022-3727/32/13/307
https://doi.org/10.1088/0022-3727/32/13/307