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Autor:
M Šı〔cha, Z Hubička, V. Studnička, T. Wagner, Alexander Tarasenko, H Šı〔chová, Václav Valvoda, L. Soukup, František Fendrych, M. Novák, Dagmar Chvostova
Publikováno v:
Surface and Coatings Technology. :321-326
The RF plasma chemical reactor with low pressure supersonic plasma jet system (RPJ) has been used for deposition of Cu 3 N thin films. From comparison of experimental values of composition weight per cent with theoretically predicted ones, and from X
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::274c57e7e7b30510ddc2495391540b83
https://doi.org/10.1016/s0257-8972(99)00129-2
https://doi.org/10.1016/s0257-8972(99)00129-2
