Výsledky vyhledávání - "Gwangsik Jeon"

Parallel Integration of Nanoscale Atomic Layer Deposited Ge2Sb2Te5 Phase-Change Memory with an Indium Gallium Zinc Oxide Thin-Film Transistor

Autor: Wonho Choi, Gilseop Kim, Hyun Young Kim, Chanyoung Yoo, Jeong Woo Jeon, Byongwoo Park, Gwangsik Jeon, Sangmin Jeon, Sukin Kang, Yonghee Lee, Cheol Seong Hwang

Publikováno v: ACS Applied Electronic Materials. 5:1721-1729

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1daf8f0ebd3844cb011cf0b9aa9c5d51
https://doi.org/10.1021/acsaelm.2c01757

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Enhanced pseudo-atomic layer deposition of antimony telluride thin films by co-injecting NH3 gas with both precursors

Autor: Sangmin Jeon, Jeong Woo Jeon, Wonho Choi, Byongwoo Park, Gwangsik Jeon, Chanyoung Yoo, Cheol Seong Hwang

Publikováno v: Journal of Materials Chemistry C. 11:3726-3735

This work proposed an enhanced deposition method of antimony telluride (Sb2Te3) thin films, which allowed facile growth at high temperatures (> 150 °C).

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::43ad9d5b59b9c40f3dc1b717903f2c14
https://doi.org/10.1039/d3tc00007a

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Atomic Layer Deposition of Sb

Autor: Chanyoung, Yoo, Jeong Woo, Jeon, Seungjae, Yoon, Yan, Cheng, Gyuseung, Han, Wonho, Choi, Byongwoo, Park, Gwangsik, Jeon, Sangmin, Jeon, Woohyun, Kim, Yonghui, Zheng, Jongho, Lee, Junku, Ahn, Sunglae, Cho, Scott B, Clendenning, Ilya V, Karpov, Yoon Kyung, Lee, Jung-Hae, Choi, Cheol Seong, Hwang

Publikováno v: Advanced materials (Deerfield Beach, Fla.).

Atomic layer deposition (ALD) of Sb

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=pmid________::366edd70a0d609220fe3fd205c60042e
https://pubmed.ncbi.nlm.nih.gov/36271720

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Atomic Layer Deposition of Sb 2 Te 3 /GeTe Superlattice Film and Its Melt‐Quenching‐Free Phase‐Transition Mechanism for Phase‐Change Memory

Autor: Chanyoung Yoo, Jeong Woo Jeon, Seungjae Yoon, Yan Cheng, Gyuseung Han, Wonho Choi, Byongwoo Park, Gwangsik Jeon, Sangmin Jeon, Woohyun Kim, Yonghui Zheng, Jongho Lee, Junku Ahn, Sunglae Cho, Scott B. Clendenning, Ilya V. Karpov, Yoon Kyung Lee, Jung‐Hae Choi, Cheol Seong Hwang

Publikováno v: Advanced Materials. 34:2207143

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5cae3b31b6d05ae7817186f83c1165e9
https://doi.org/10.1002/adma.202207143

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