Výsledky vyhledávání - "Guy A. DeRose"

Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

Autor: Scott M. Lewis, Guy A. DeRose, Hayden R. Alty, Matthew S. Hunt, Nathan Lee, James A. Mann, Richard Grindell, Alex Wertheim, Lucia De Rose, Antonio Fernandez, Christopher A. Muryn, George F. S. Whitehead, Grigore A. Timco, Axel Scherer, Richard E. P. Winpenny

Publikováno v: Antonio Fernandez Mato
Lewis, S M, DeRose, G A, Alty, H R, Hunt, M S, Lee, N, Mann, J A, Grindell, R, Wertheim, A, De Rose, L, Fernandez, A, Muryn, C A, Whitehead, G F S, Timco, G A, Scherer, A & Winpenny, R E P 2022, ' Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography ', Advanced Functional Materials, vol. 32, no. 32, 2202710 . https://doi.org/10.1002/adfm.202202710

A new class of electron bean negative tone resist materials has been developed based on heterometallic rings. The initial resist performance demonstrates a resolution of 15 nm half-pitch but at the expense of a low sensitivity. To improve sensitivity

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::44d4c67f71d03b797d4b219a30c11339
https://resolver.caltech.edu/CaltechAUTHORS:20220718-951245300

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The efficacy of a topical formulation of selamectin plus sarolaner in preventing the development of a macrocyclic lactone-resistant strain of Dirofilaria immitis in cats

Autor: Tom L. McTier, Laura Hedges, Sean P. Mahabir, Guy F. DeRose, Aleah Pullins

Publikováno v: Veterinary parasitology. 282

Revolution®/Stronghold® Plus, a topical endectocide incorporating 6 mg/kg selamectin plus 1 mg/kg sarolaner, is approved for use in cats to prevent heartworm disease. The efficacy of selamectin has not previously been evaluated against any macrocyc

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7c8be55bd1c516e1d8094c65561f2752
https://pubmed.ncbi.nlm.nih.gov/32460111

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Use of Supramolecular Assemblies as Lithographic Resists

Autor: Scott M. Lewis, George F. S. Whitehead, Fredrik Schedin, Guy A. DeRose, Stephen G. Yeates, Jesús Ferrando-Soria, Axel Scherer, Grigore A. Timco, Richard E. P. Winpenny, Hayden R. Alty, Sarah Varey, Matthew S. Hunt, Andreas K. Kostopoulos, Agnese Lagzda, Antonio Fernandez, Christopher A. Muryn

Publikováno v: Lewis, S, Fernandez Mato, A, DeRose, G A, Hunt, M, Whitehead, G, Lagzda, A, Alty, H, Ferrando Soria, J, Varey, S, Kostopoulos, A, Schedin, B, Muryn, C, Timco, G, Scherer, A, Yeates, S & Winpenny, R 2017, ' Use of Supramolecular Assemblies as Lithographic Resists ', Angewandte Chemie-International Edition, vol. 56, no. 24 . https://doi.org/10.1002/anie.201700224

We show that by design we can create a new resist materials for electron beam lithography, based on a supramolecular assembly. The initial studies show that via this supramolecular approach high resolution structures can be written which showunpreced

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::749a433e80f61731a85cc21bc8d1d750
https://doi.org/10.1002/ange.201700224

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Plasma-etched pattern transfer of sub-10 nm structures using a metal–organic resist and helium ion beam lithography

Autor: Grigore A. Timco, Richard E. P. Winpenny, Jarvis Li, Axel Scherer, Matthew S. Hunt, Hayden R. Alty, Stephen G. Yeates, Alex Wertheim, Scott M. Lewis, Lucia B. De Rose, Guy A. DeRose

Publikováno v: Lewis, S M, Hunt, M, Derose, G, Alty, H, Li, J, Wertheim, A, Derose, L, Timco, G A, Scherer, A, Yeates, S G & Winpenny, R E P 2019, ' Plasma-etched pattern transfer of sub-10 nm structures using a metal–organic resist and helium ion beam lithography ', Nano Letters . https://doi.org/10.1021/acs.nanolett.9b01911

Field-emission devices are promising candidates to replace silicon fin field-effect transistors as next-generation nanoelectronic components. For these devices to be adopted, nanoscale field emitters with nanoscale gaps between them need to be fabric

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::50f008c97f1d4ff941dee0b4218d4f12
https://doi.org/10.1021/acs.nanolett.9b01911

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Design and implementation of the next generation electron beam resists for the production of EUVL photomasks

Autor: Trevor M. Fowler, Alex Werthiem, Christopher A. Muryn, Axel Scherer, Jarvis Li, Guy A. DeRose, Grigore A. Timco, Stephen G. Yeates, Hayden R. Alty, Matthew S. Hunt, Sang Kook Lee, Scott M. Lewis, Richard E. P. Winpenny

Publikováno v: Photomask Technology 2018.

A new class of resist materials has been developed that is based on a family of heterometallic rings. The work is founded on a Monte Carlo simulation that utilizes a secondary and Auger electron generation model to design resist materials for high re

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7c18f0aacd6f47929b9a97f26d7f22fd
https://doi.org/10.1117/12.2501808

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SML electron beam resist

Autor: Guy A. DeRose, Scott M. Lewis

In this chapter, the focus was on investigating a suitable technology to fabricate the next generation optical photomasks with a one-step process. This was achieved by a fabricating a novel nanocomposite electron beam resist that incorporated azo dye

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4fa306ab64139a466debe8f1a6444bc4
https://doi.org/10.1016/b978-0-08-100354-1.00012-0

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Polymer microring coupled-resonator optical waveguides

Autor: Amnon Yariv, Guy A. DeRose, Lin Zhu, Joyce K. S. Poon

Publikováno v: Journal of Lightwave Technology. 24:1843-1849

We present measurements of the transmission and dispersion properties of coupled-resonator optical waveguides (CROWs) consisting of weakly coupled polymer microring resonators. The fabrication and the measurement methods of the CROWs are discussed as

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::863c81466c8b43c29a25770b385489e4
https://doi.org/10.1109/jlt.2006.870971

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Periodic sub-wavelength electron beam lithography defined photonic crystals for mode control in semiconductor lasers

Autor: Amnon Yariv, Joyce K. S. Poon, Lin Zhu, Axel Scherer, Guy A. DeRose

Publikováno v: Microelectronic Engineering. 85:758-760

Surface structure lasers possess lithographically defined patterns, such as gratings and waveguides, on the wafer surface and are usually fabricated without semiconductor regrowth. Optical surface structures typically require sub-micron to nano-scale

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9cc3813b7cb2e7994dabd4d6fa41a964
https://doi.org/10.1016/j.mee.2007.12.030

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