Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Gurpreet S. Lugani"'
Autor:
Janet R. Wu, Dan B. Millward, Dung Quach, Mingqi Li, Peter Trefonas, Scott L. Light, Shih-Wei Chang, Valeriy V. Ginzburg, Gurpreet S. Lugani, Phillip D. Hustad
Publikováno v:
Alternative Lithographic Technologies VII.
Directed self-assembly (DSA) of block copolymers (BCPs) is a promising technology for advanced patterning at future technology nodes, but significant hurdles remain for commercial implementation. While chemoepitaxy processes employing poly(styrene-bl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::042bd8eaee4ddeb7dcac298ddaf9efa1
https://doi.org/10.1117/12.2085807
https://doi.org/10.1117/12.2085807
Autor:
Ardavan Niroomand, Peter Trefonas, Dan B. Millward, Dung Quach, Gurpreet S. Lugani, Valeriy V. Ginzburg, Scott L. Light, Phillip D. Hustad
Publikováno v:
Alternative Lithographic Technologies VII.
Block copolymer directed self-assembly (BCP-DSA) may provide a less costly method of forming sub-38nm pitch line-space patterns relative to proven HVM methods, but DSA needs to provide equivalent or improved defect density and pattern quality to warr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e68246e6ecdc21068e77423ab1ec35db
https://doi.org/10.1117/12.2086693
https://doi.org/10.1117/12.2086693
Autor:
Shih-Wei Chang, Dan B. Millward, Phillip D. Hustad, Gurpreet S. Lugani, Scott L. Light, Ranjan Khurana, Ardavan Niroomand, Christopher Nam Lee, Peter Trefonas, Dung Quach
Publikováno v:
SPIE Proceedings.
Block co-polymer directed self-assembly (BCP DSA) has become an area of fervent research activity as a potential alternative or adjunct to EUV lithography or self-aligned pitch multiplication strategies. This presentation will evaluate two DSA strate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::446f0162a8b0288c7bed33b63c052d7a
https://doi.org/10.1117/12.2045580
https://doi.org/10.1117/12.2045580