Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Guo-Tsai Huang"'
Autor:
Guo-Tsai Huang, 黃國財
92
Accurate monitoring of the thickness and elastic properties of thin films with thickness in the sub-micrometer range is very important in the area of N/MEMS fabrication. In this thesis, we utilize a RF surface acoustic wave (SAW) device to me
Accurate monitoring of the thickness and elastic properties of thin films with thickness in the sub-micrometer range is very important in the area of N/MEMS fabrication. In this thesis, we utilize a RF surface acoustic wave (SAW) device to me
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/51457670894342359620
Autor:
Narjes Javaheri, John Lin, Benny Gosali, Antonios Zagaris, Ken Chang, Eason Su, Cathy Wang, Murat Bozkurt, Guo-Tsai Huang, Simon Gijsbert Josephus Mathijssen, Arie Jeffrey Den Boef, Kai-Hsiung Chen, Marc Noot, Kaustuve Bhattacharyya, Reza Hajiahmadi
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
The on-product overlay roadmap demands an aggressive overlay requirement in the advanced node. Currently the on-product overlay is dominated by effects coming from wafer processing and overlay target detectability. Processing effects such as symmetri
Autor:
Guo-Tsai Huang, John Lin, Christophe Fouquet, Kevin Cheng, Eason Su, Arie Jeffrey Den Boef, Benny Gosali, Ken Chang, Marc Noot, Kai-Hsiung Chen, Kaustuve Bhattacharyya, Hammer Chang, Cathy Wang, Sax Liao
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
Success of diffraction-based overlay (DBO) technique1,4,5 in the industry is not just for its good precision and low toolinduced shift, but also for the measurement accuracy2 and robustness that DBO can provide. Significant efforts are put in to capi
Autor:
Martin Jacobus Johan Jak, Andreas Fuchs, Kevin Cheng, Grzegorz Grzela, L. G. Terng, Wilson Tzeng, Christophe Fouquet, Marc Noot, Guo-Tsai Huang, Ken Chang, Y. C. Wang, Eason Su, Omer Adam, Arie Jeffrey Den Boef, Chih-Ming Ke, Kai-Hsiung Chen, Cathy Wang, Sax Liao, Vincent Couraudon, Kaustuve Bhattacharyya
Publikováno v:
SPIE Proceedings.
The optical coupling between gratings in diffraction-based overlay triggers a swing-curve1,6 like response of the target’s signal contrast and overlay sensitivity through measurement wavelengths and polarizations. This means there are distinct meas
Autor:
Jon Wu, Hsieh Hung-Chih, Martin Ebert, Kai-Hsiung Chen, Aileen Soco, Pavel Izikson, Yong Ho Kim, Maxime d'Alfonso, Guo-Tsai Huang, Wei-Feng Ni, Aysegul Cumurcu Gysen, Shiuan-An Rao, Jeroen Ottens, Jacky Huang, Chih-Ming Ke, T. K. Chuang, Jenny Yueh, Tjitte Nooitgedagt, Shu-Chuan Chuang
Publikováno v:
SPIE Proceedings.
On-product overlay requirements are becoming more challenging with every next technology node due to the continued decrease of the device dimensions and process tolerances. Therefore, current and future technology nodes require demanding metrology ca
Autor:
Mathijssen, Simon, Noot, Marc, Bozkurt, Murat, Javaheri, Narjes, Hajiahmadi, Reza, Zagaris, Antonios, Ken Chang, Gosali, Benny, Su, Eason, Wang, Cathy, den Boef, Arie, Bhattacharyya, Kaustuve, Guo-Tsai Huang, Kai-Hsiung Chen, Lin, John
Publikováno v:
Proceedings of SPIE; 1/22/2019, Vol. 10959, p1-8, 8p
Publikováno v:
Journal of Applied Physics; 4/1/2005, Vol. 97 Issue 7, p073510, 5p, 1 Diagram, 3 Charts, 7 Graphs
Autor:
Bhattacharyya, Kaustuve, Noot, Marc, Chang, Hammer, Sax Liao, Chang, Ken, Gosali, Benny, Su, Eason, Wang, Cathy, den Boef, Arie, Fouquet, Christophe, Guo-Tsai Huang, Kai-Hsiung Chen, Cheng, Kevin, Lin, John
Publikováno v:
Proceedings of SPIE; 2018, Vol. 10585, p1-8, 8p
Autor:
Y. C. Ku, Takuya Mori, Chris de Ruiter, Greet Storms, Guo-Tsai Huang, Jon Wu, Christophe Fouquet, Kelvin Pao, Charlie Chen, Tatung Chow, C. W. Hsieh, Jacky Huang, KS Chen, T. S. Gau, Martijn van Veen, Martijn Maassen, Reinder Teun Plug, Pu Li, Chih-Ming Ke, Arie Jeffrey Den Boef, Paul Christiaan Hinnen, Hua Xu, Maurits van de Schaar, Kai-Hsiung Chen, Youping Zhang, Kaustuve Bhattacharyya, Yi-Yin Chen, Gary Zhang, Eric Verhoeven, Steffen Meyer
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
In order to meet current and future node overlay, CD and focus requirements, metrology and process control performance need to be continuously improved. In addition, more complex lithography techniques, such as double patterning, advanced device desi
Autor:
Kai-Hsiung Chen, Kaustuve Bhattacharyya, Arie Jeffrey Den Boef, Maurits van der Schaar, Henk-Jan H. Smilde, Stephen P. Morgan, Andreas Fuchs, Martin Jacobus Johan Jak, Murat Bozkurt, Mark van Schijndel, Steffen Meyer, Chih-Ming Ke, Guo-Tsai Huang
Publikováno v:
SPIE Proceedings.
The target size reduction for overlay metrology is driven by the optimization of the device area. Furthermore, for the future semiconductor nodes accurate metrology on the order of 0.2 nm is necessary locally in the device area, requiring small in-di