Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Guo-Qiang P. Lo"'
Publikováno v:
ECS Transactions. 16:747-754
To reap the full benefits of superior transport and optical properties of germanium, a low-resistance metal-germanides contact that is compatible with existing Si CMOS process technology would be highly desirable. In this abstract, we report the deve
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e0c18b16dce66f83ec115d7dcac4ddd4
https://doi.org/10.1149/1.2986834
https://doi.org/10.1149/1.2986834
Autor:
N. Balasubramanian, S.C. Rustagi, Navab Singh, Kavitha Devi Buddharaju, Guo-Qiang P. Lo, Dim-Lee Kwong
Publikováno v:
ECS Transactions. 16:729-729
Though top-down approach, which leverages on conventional lithography, patterning for wire formation, has been considered as the closest to the manufacturing format, many technology issues or even barriers are still widely remained. These technology
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::658352c675c0da10c6bd2fd1ab1d726a
https://doi.org/10.1149/1.2986830
https://doi.org/10.1149/1.2986830
Autor:
Guo-Qiang P. Lo
Publikováno v:
ECS Meeting Abstracts. :2455-2455
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef8d3995e82711ba27d0b308a6d019ab
https://doi.org/10.1149/ma2008-02/37/2455
https://doi.org/10.1149/ma2008-02/37/2455
Publikováno v:
ECS Meeting Abstracts. :2459-2459
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::348f8fbc7aff24300391a05ec86d14ca
https://doi.org/10.1149/ma2008-02/37/2459
https://doi.org/10.1149/ma2008-02/37/2459