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pro vyhledávání: '"Guo Xiang Ning"'
Publikováno v:
SPIE Proceedings.
Historical data indicates reticle write times are increasing node-to-node. The cost of mask sets is increasing driven by the tighter requirements and more levels. The regular introduction of new generations of mask patterning tools with improved perf
Autor:
Piyush Verma, Keith Standiford, Robert C. Pack, Akira Fujimura, Todd P. Lukanc, Gek Soon Chua, Linyong Pang, Fadi Batarseh, Guo Xiang Ning
Publikováno v:
SPIE Proceedings.
A methodology is described wherein a calibrated model-based ‘Virtual’ Variable Shaped Beam (VSB) mask writer process simulator is used to accurately verify complex Optical Proximity Correction (OPC) and Inverse Lithography Technology (ILT) mask d