Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Gunter Antesberger"'
Autor:
Vladimir Dmitriev, Stephanie Winkelmeier, Guy Ben-Zvi, Gunter Antesberger, Avi Cohen, Erez Graitzer
Publikováno v:
SPIE Proceedings.
The 2009 ITRS update specifies wafer overlay control as one of the major tasks for the sub 40 nm nodes. Wafer overlay is strongly dependent on mask image placement error (registration errors or Reg errors)1 in addition to CD control and defect contro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b36873929252a830b0e778b2fbef800
https://doi.org/10.1117/12.879885
https://doi.org/10.1117/12.879885
Autor:
Oliver Loeffler, Gunter Antesberger, Frank Laske, Dieter Adam, Christian Enkrich, Karl-Heinrich Schmidt, Klaus-Dieter Roeth
Publikováno v:
SPIE Proceedings.
The development of the 45-nm node manufacturing process at leading edge mask shops is nearly finished. In order to reach the required registration measurement performance with a precision to tolerance value of P/T=0.25, the measurement error may not
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::be8d1424ab2d208c88c3d05cd59a9a0d
https://doi.org/10.1117/12.793104
https://doi.org/10.1117/12.793104
Autor:
Carola Bläsing, Jens Rudolf, Eric Cotte, Klaus Rinn, Gunter Antesberger, Wolfgang Fricke, Sven Knoth, Frank Laske, Benjamin Alles
Publikováno v:
SPIE Proceedings.
Following the international technology roadmap for semiconductors the image placement precision for the 65nm technology node has to be 7nm. In order to be measurement capable, the measurement error of a 2D coordinate measurement system has to be clos
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::09a0a6fe95b5da5a3e7864b5ca03d2ce
https://doi.org/10.1117/12.686089
https://doi.org/10.1117/12.686089
Autor:
Andreas Frangen, Manuel Vorwerk, Benjamin Alles, Eric Cotte, Frank Katzwinkel, Timo Wandel, Silvio Teuber, Gunter Antesberger
Publikováno v:
SPIE Proceedings.
In case drastic changes need to be made to tool configurations or blank specifications, it is important to know as early as possible under which conditions the tight image placement requirements of future lithography nodes can be achieved. Modeling,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::050f68c58d86a97a8d1e83b5edb36b2d
https://doi.org/10.1117/12.656373
https://doi.org/10.1117/12.656373
Autor:
Gregory P. Hughes, Alex Buxbaum, Troy Morrison, Gunter Antesberger, Stefan Burges, Cindy Goodman
Publikováno v:
SPIE Proceedings.
A NIST traceable phase1 shift standard has been designed, fabricated, and tested on three phase shift measurement tools using different wavelengths. By using the fundamentals of NIST traceable step height, quartz index, and the understanding of the i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5bf7e828405e3396562c5d42bc636ed2
https://doi.org/10.1117/12.581222
https://doi.org/10.1117/12.581222
Publikováno v:
SPIE Proceedings.
An assessment of the mechanical performance of pellicles from different vendors was performed. Pellicle-induced distortions were experimentally measured and numerical simulations were run to predict what improvements were desirable. The experiments i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4bfd9c0e95d14950764ecc9e0d1c005a
https://doi.org/10.1117/12.569280
https://doi.org/10.1117/12.569280