Zobrazeno 1 - 10
of 43
pro vyhledávání: '"Guk-Jin Kim"'
Publikováno v:
Microelectronic Engineering. 177:35-40
To solve the defect problem during the exposure process of EUV lithography (EUVL), an EUV pellicle is suggested as a solution. Even though use of an EUV pellicle is considered an essential solution for defect control during the exposure process, it i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::afa0d97b7ae96bd7f52e9ad039f274dd
https://doi.org/10.1016/j.mee.2017.01.031
https://doi.org/10.1016/j.mee.2017.01.031
Publikováno v:
Journal of Soil and Groundwater Environment. 21:14-20
Remediation of crude oil contaminated soil is complicate and hard to apply traditional methods because of its persistency,durability, and high viscosity. Therefore, in this study, the efficiency of crude oil contaminated soil remediation was testedby
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::37b54c9e00f0dbbcaa3bfd280db3d64a
https://doi.org/10.7857/jsge.2016.21.3.014
https://doi.org/10.7857/jsge.2016.21.3.014
Publikováno v:
Journal of Soil and Groundwater Environment. 21:72-79
Bioremediation is one of the most effective ways to remediate TPH-contaminated sites. However, under actual field conditions that are not at the optimum temperature, degradation of microorganisms is generally reduced, which is why the efficiency of b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a68783c180ce83ddaf53b79f0b0cd6aa
https://doi.org/10.7857/jsge.2016.21.1.072
https://doi.org/10.7857/jsge.2016.21.1.072
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2017.
In EUV lithography, one of problems is defect control, so that the EUV pellicle is required to protect EUV mask from contaminations. The EUV pellicle should be extremely thin thickness and it is easy to be deformed as wrinkle and deflection during th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e10fff474533bb0dfdf13811ebecedd9
https://doi.org/10.1117/12.2281036
https://doi.org/10.1117/12.2281036
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2017.
The extreme-ultraviolet (EUV) mask cannot be inspected by using actinic inspection system because there is no commercial EUV actinic mask inspection system available yet. Moreover, the EUV pellicle must be removed if the EUV mask is inspected by non-
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::435bf62906ebc728fc5f9ee3b8ae0ab9
https://doi.org/10.1117/12.2280618
https://doi.org/10.1117/12.2280618
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet (EUV) pellicle is required for protecting the EUV mask from defects, contaminations, and particles during exposure process. EUV pellicle should be very thin for high transmission of EUV wavelength. Therefore, EUV pellicle can be e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f042a1bfc97c531571f5f8ed1f9af41f
https://doi.org/10.1117/12.2258189
https://doi.org/10.1117/12.2258189
Publikováno v:
SPIE Proceedings.
There has been reports of EUV scanner aberration effects to the patterns down to 18 nm half-pitch (hp). Maximum aberration of the latest EUV scanner is reported as 25 mλ. We believe that the first EUV mass production will be applied to the devices o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a1348e64b41f9438c1817bea59bc41e6
https://doi.org/10.1117/12.2261827
https://doi.org/10.1117/12.2261827
Publikováno v:
SPIE Proceedings.
EUV lithography is one of the promising technologies for 1X nm patterning. EUV lithography has high resolution capability because of short wavelength of source but it has some particular patterning problems which are not appeared a t optical lithogra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ba1380f0939c1f376272ccd96b941bd5
https://doi.org/10.1117/12.2258188
https://doi.org/10.1117/12.2258188
Publikováno v:
Journal of Soil and Groundwater Environment. 18:73-81
Various remediation methods have been applied to clean soils contaminated with pollutants. They remove contaminants from the soils by utilizing physicochemical, biological, and thermal processes and can satisfy soil remediation standards within a lim
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::99cc3eb01e5ec0b95cb5be5861b39b50
https://doi.org/10.7857/jsge.2013.18.3.073
https://doi.org/10.7857/jsge.2013.18.3.073
Autor:
Min-Su Kim, Hye-Keun Oh, Eytan Barouch, Michael Yeung, Guk-Jin Kim, Jin-Goo Park, In-Seon Kim
Publikováno v:
SPIE Proceedings.
For protecting mask from debris, EUV pellicle is considered as a most effective solution. EUV pellicle can avoid contamination on mask by covering mask. Usage of EUV pellicle can reduce mask damage caused by contamination but the pellicle involves tr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c24b0a9d359e4e1e41821ec17fd30ec
https://doi.org/10.1117/12.2242999
https://doi.org/10.1117/12.2242999